Geometrical Anatomy for Oxygen Vacancies in Epitaxial Hf<sub>0.5</sub>Zr<sub>0.5</sub>O<sub>2</sub> Films Grown via Atomic Layer Deposition

Abstract The selective influence of elastic strain on the formation of oxygen deficiencies in (001)‐, (110)‐, and (111)‐ epitaxial Hf 0.5 Zr 0.5 O 2 films grown by using atomic layer deposition is reported. Optical spectroscopy, conducted using UV–vis spectroscopic ellipsometry on these Hf 0.5 Zr 0.5 O 2 films grown on yttria‐stabilized zirconia substrates, revealed a dominant shallow trap level in the (111)‐oriented Hf 0.5 Zr 0.5 O 2 film. X‐ray photoemission spectroscopy demonstrated that the strong oxygen deficiency is preferred in the (111)‐oriented Hf 0.5 Zr 0.5 O 2 film. Density functional theory calculations of oxygen vacancy formation energy also showed a pronounced preference for oxygen deficiencies in the (111) orientation. This selective formation of oxygen vacancies in the (111)‐oriented Hf 0.5 Zr 0.5 O 2 film suggests that the latent phenomena associated with oxygen defects in functional Hf 0.5 Zr 0.5 O 2 films are partly attributed to the directional strain in the (111) orientation.

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Publication Details

Journal
Advanced Materials Interfaces
Published
2024-12-04
DOI
https://doi.org/10.1002/admi.202400742
Primary Topic
Ferroelectric and Negative Capacitance Devices
Type
article
Field-Weighted Citation Impact
0.00

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article

Geometrical Anatomy for Oxygen Vacancies in Epitaxial Hf0.5Zr0.5O2 Films Grown via Atomic Layer Deposition

Hongju Kim, Jung Woo Cho, Chihwan An, Myeong Seop Song et al.
Advanced Materials Interfaces
Ferroelectric and Negative Capacitance Devices
article

Geometrical Anatomy for Oxygen Vacancies in Epitaxial Hf0.5Zr0.5O2 Films Grown via Atomic Layer Deposition

Hongju Kim, Jung Woo Cho, Chihwan An, Myeong Seop Song, Seung Chul Chae, Changhee Sohn, Baekjune Kang, Jun Hee Lee, Tae Yoon Lee
article en

Abstract

Abstract The selective influence of elastic strain on the formation of oxygen deficiencies in (001)‐, (110)‐, and (111)‐ epitaxial Hf 0.5 Zr 0.5 O 2 films grown by using atomic layer deposition is reported. Optical spectroscopy, conducted using UV–vis spectroscopic ellipsometry on these Hf 0.5 Zr 0.5 O 2 films grown on yttria‐stabilized zirconia substrates, revealed a dominant shallow trap level in the (111)‐oriented Hf 0.5 Zr 0.5 O 2 film. X‐ray photoemission spectroscopy demonstrated that the strong oxygen deficiency is preferred in the (111)‐oriented Hf 0.5 Zr 0.5 O 2 film. Density functional theory calculations of oxygen vacancy formation energy also showed a pronounced preference for oxygen deficiencies in the (111) orientation. This selective formation of oxygen vacancies in the (111)‐oriented Hf 0.5 Zr 0.5 O 2 film suggests that the latent phenomena associated with oxygen defects in functional Hf 0.5 Zr 0.5 O 2 films are partly attributed to the directional strain in the (111) orientation.

Advanced Materials InterfacesVol. 12(8)
Seoul National University of Education (KR), Ulsan National Institute of Science and Technology (KR)
National Research Foundation, Ministry of Trade, Industry and Energy, Korea Institute for Advancement of Technology, National Research Foundation of Korea, Iran Telecommunication Research Center, Ministry of Science and ICT, South Korea, Institute for Information and Communications Technology Promotion, National Supercomputing Center, Korea Institute of Science and Technology Information
Openalex Percentile: Top 80%
Ferroelectric and Negative Capacitance Devices
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