High-efficiency dual-level grating coupler with heterogeneous integration on lithium niobate

In this article, a high-efficiency grating coupler based on a lithium niobate platform is presented. To enhance the coupling efficiency, a silicon nitride strip waveguide grating is introduced beneath the lithium niobate grating. Through the optimization of grating period, duty cycle, and other parameters using a particle swarm optimization (PSO) algorithm, a TE-polarized grating coupler with high coupling efficiency is achieved, resulting in a simulated peak coupling efficiency of approximately -2.19 dB. To further improve the performance of the grating coupler, a chirped design of the grating etch slots is implemented. A double-layer design with inversely linear variation in duty cycle is adopted, and the variation coefficients are optimized using the PSO algorithm, achieving a simulated peak coupling efficiency of approximately -1.72 dB with a 1 dB bandwidth of approximately 42 nm. Process tolerance simulations are also performed on the key parameters of the double-layer grating coupler, demonstrating good process tolerance of this design.

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Published
2024-12-04
DOI
https://doi.org/10.1117/12.3038770
Primary Topic
Photonic and Optical Devices
Type
article
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article

High-efficiency dual-level grating coupler with heterogeneous integration on lithium niobate

Qiannan Zhu, Yan Cai, Shuxiao Wang
Photonic and Optical Devices
article

High-efficiency dual-level grating coupler with heterogeneous integration on lithium niobate

Qiannan Zhu, Yan Cai, Shuxiao Wang
article en

Abstract

In this article, a high-efficiency grating coupler based on a lithium niobate platform is presented. To enhance the coupling efficiency, a silicon nitride strip waveguide grating is introduced beneath the lithium niobate grating. Through the optimization of grating period, duty cycle, and other parameters using a particle swarm optimization (PSO) algorithm, a TE-polarized grating coupler with high coupling efficiency is achieved, resulting in a simulated peak coupling efficiency of approximately -2.19 dB. To further improve the performance of the grating coupler, a chirped design of the grating etch slots is implemented. A double-layer design with inversely linear variation in duty cycle is adopted, and the variation coefficients are optimized using the PSO algorithm, achieving a simulated peak coupling efficiency of approximately -1.72 dB with a 1 dB bandwidth of approximately 42 nm. Process tolerance simulations are also performed on the key parameters of the double-layer grating coupler, demonstrating good process tolerance of this design.

Shanghai Industrial Technology Institute (CN), Shanghai Institute of Microsystem and Information Technology (CN), University of Chinese Academy of Sciences (CN)
Affordable and clean energy
Openalex Percentile: Top 80%
Photonic and Optical Devices
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