Microreactor‐Assisted Soft Lithography for Rapid and Inexpensive Patterning of Nanostructured ZnO/CuO Heterojunctions
Microreactor-Assisted Soft Lithography In article number 2401112, Chih-hung Chang and co-workers demonstrate a novel microreactor-assisted soft lithography process to deposit nanostructures with multiscale 3D geometric shapes and fabricate p-n heterojunction with n-type ZnO and p-type CuO. Factors determining the printing process are studied based on COMSOL simulation and experimental results. This novel process enables the scalable fabrication of complicated functional nanostructures on the desired regions using low-cost and facile solution-based methods.
Authors
- Zhongwei Gao (ORCID: https://orcid.org/0000-0001-7449-0098)
- V. Vinay K. Doddapaneni (ORCID: https://orcid.org/0000-0002-1221-3252)
- Chih‐Hung Chang (ORCID: https://orcid.org/0000-0003-3429-3940)
- Rajiv Malhotra (ORCID: https://orcid.org/0000-0003-4914-4497)
- Changqing Pan
Institutions
- Rutgers, The State University of New Jersey (US)
- Oregon State University (US)
Publication Details
- Journal
- Advanced Engineering Materials
- Published
- 2024-12-01
- DOI
- https://doi.org/10.1002/adem.202470065
- Citations
- 2
- Primary Topic
- Nanofabrication and Lithography Techniques
- Type
- article
- Field-Weighted Citation Impact
- 0.37