Microreactor‐Assisted Soft Lithography for Rapid and Inexpensive Patterning of Nanostructured ZnO/CuO Heterojunctions

Microreactor-Assisted Soft Lithography In article number 2401112, Chih-hung Chang and co-workers demonstrate a novel microreactor-assisted soft lithography process to deposit nanostructures with multiscale 3D geometric shapes and fabricate p-n heterojunction with n-type ZnO and p-type CuO. Factors determining the printing process are studied based on COMSOL simulation and experimental results. This novel process enables the scalable fabrication of complicated functional nanostructures on the desired regions using low-cost and facile solution-based methods.

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Publication Details

Journal
Advanced Engineering Materials
Published
2024-12-01
DOI
https://doi.org/10.1002/adem.202470065
Citations
2
Primary Topic
Nanofabrication and Lithography Techniques
Type
article
Field-Weighted Citation Impact
0.37
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article

Microreactor‐Assisted Soft Lithography for Rapid and Inexpensive Patterning of Nanostructured ZnO/CuO Heterojunctions

Zhongwei Gao, V. Vinay K. Doddapaneni, Chih‐Hung Chang, Rajiv Malhotra et al.
2 citations
Advanced Engineering Materials
Nanofabrication and Lithography Techniques
0.37
article

Microreactor‐Assisted Soft Lithography for Rapid and Inexpensive Patterning of Nanostructured ZnO/CuO Heterojunctions

Zhongwei Gao, V. Vinay K. Doddapaneni, Chih‐Hung Chang, Rajiv Malhotra, Changqing Pan
article en
2 citations

Abstract

Microreactor-Assisted Soft Lithography In article number 2401112, Chih-hung Chang and co-workers demonstrate a novel microreactor-assisted soft lithography process to deposit nanostructures with multiscale 3D geometric shapes and fabricate p-n heterojunction with n-type ZnO and p-type CuO. Factors determining the printing process are studied based on COMSOL simulation and experimental results. This novel process enables the scalable fabrication of complicated functional nanostructures on the desired regions using low-cost and facile solution-based methods.

Advanced Engineering MaterialsVol. 26(23)
Rutgers, The State University of New Jersey (US), Oregon State University (US)
Openalex Percentile: Top 42%
Nanofabrication and Lithography Techniques
0.37
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