Capacitive Deep Trench Interface Characterizations and Dark Current Modeling for Photogate Pixels

In a CMOS image sensor, the total dark current (DC) is the sum of several contributions that are difficult to discriminate, even if activation energies are extracted. For example, when considering the interface generation, there may still be ambiguities about which interface, whether the front-side, back-side, or trench isolation is dominant. Electrical characterizations on test structures are powerful tools for investigating specific interfaces and providing complementary information, such as passivation quality. In this work, chemical and field-effect passivation are studied using capacitance-voltage measurements on a dedicated test structure. Quantitative results are obtained, enabling the computation of DC based on the Shockley-Read–Hall (SRH) formalism. This model, which depends on the voltage applied to the trench, fits direct DC measurements.

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Publication Details

Journal
IEEE Transactions on Electron Devices
Published
2024-12-03
DOI
https://doi.org/10.1109/ted.2024.3501255
Primary Topic
CCD and CMOS Imaging Sensors
Type
article
Field-Weighted Citation Impact
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article

Capacitive Deep Trench Interface Characterizations and Dark Current Modeling for Photogate Pixels

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IEEE Transactions on Electron Devices
CCD and CMOS Imaging Sensors
article

Capacitive Deep Trench Interface Characterizations and Dark Current Modeling for Photogate Pixels

Stéphane Ricq, Olivier Marcelot, Thomas Dalleau, Pierre Magnan, Samuel Tlemsani, J.-P. Carrere, Emilie De Pretto
article en

Abstract

In a CMOS image sensor, the total dark current (DC) is the sum of several contributions that are difficult to discriminate, even if activation energies are extracted. For example, when considering the interface generation, there may still be ambiguities about which interface, whether the front-side, back-side, or trench isolation is dominant. Electrical characterizations on test structures are powerful tools for investigating specific interfaces and providing complementary information, such as passivation quality. In this work, chemical and field-effect passivation are studied using capacitance-voltage measurements on a dedicated test structure. Quantitative results are obtained, enabling the computation of DC based on the Shockley-Read–Hall (SRH) formalism. This model, which depends on the voltage applied to the trench, fits direct DC measurements.

IEEE Transactions on Electron DevicesVol. 72(1)
STMicroelectronics (India) (IN), STMicroelectronics (France) (FR)
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Openalex Percentile: Top 81%
CCD and CMOS Imaging Sensors
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