Nanosecond Breakdown Characteristics of C4F7N and Various Mixtures at Pressures Above 1 Atmosphere in Comparison with SF6

This report evaluates the pulsed breakdown performance of C4F7N under a 6.8 kV/ns voltage excitation. The pulsed dielectric strength of C4F7N is compared to SF6 in the same experimental setup, and it is found that C4F7N concentrations of 50% or greater are required to achieve a dielectric strength greater than or equal to SF6. Pure C4F7N demonstrated higher electric field hold-off for longer time periods and less statistical variance under pulsed conditions when compared to SF6. Mixtures of 50%C4F7N with N2 or CO2 as buffer gases showed no appreciable difference in pulsed dielectric strength.

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Publication Details

Journal
Applied Sciences
Published
2024-12-03
DOI
https://doi.org/10.3390/app142311268
Citations
1
Primary Topic
Plasma Diagnostics and Applications
Type
article
Field-Weighted Citation Impact
0.21

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Nanosecond Breakdown Characteristics of C4F7N and Various Mixtures at Pressures Above 1 Atmosphere in Comparison with SF6

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article

Nanosecond Breakdown Characteristics of C4F7N and Various Mixtures at Pressures Above 1 Atmosphere in Comparison with SF6

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article en
1 citations

Abstract

This report evaluates the pulsed breakdown performance of C4F7N under a 6.8 kV/ns voltage excitation. The pulsed dielectric strength of C4F7N is compared to SF6 in the same experimental setup, and it is found that C4F7N concentrations of 50% or greater are required to achieve a dielectric strength greater than or equal to SF6. Pure C4F7N demonstrated higher electric field hold-off for longer time periods and less statistical variance under pulsed conditions when compared to SF6. Mixtures of 50%C4F7N with N2 or CO2 as buffer gases showed no appreciable difference in pulsed dielectric strength.

Applied SciencesVol. 14(23)
Texas Tech University (US), Lawrence Livermore National Laboratory (US)
U.S. Department of Energy, Lawrence Livermore National Laboratory
Affordable and clean energy
Openalex Percentile: Top 45%
Plasma Diagnostics and Applications
0.21
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