High Frequency and High Gain Split-Gate Monolayer MoS<sub>2</sub> Field Effect Transistor for Common Source Amplifier Circuit

For analog systems, the field effect transistor (FET) is regarded as one of the fundamental electronic devices. However, its small gain restricts the application of FET in amplifiers and analog circuits. Here, we design a split-gate FET based on monolayer MoS2 and optimize the key performance index of intrinsic gain (Av0), transconductance frequency product (TFP), and gain frequency product (GFP). The maximum Av0 of 293 V/V and cutoff frequency of hundreds of GHz are obtained by optimizing the control gate positions and input gate voltage. With an equivalent oxide thickness of 0.3 nm, the FET possesses a superior TFP of 7657 GHz/V and GFP of 14148 GHz. In particular, a common source amplifier circuit utilizing the split-gate FET is established, achieving the largest circuit gain of approximately 277 V/V. This work provides a promising route to use split-gate FET to realize a common source amplifier circuit with high circuit gain.

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Publication Details

Journal
ACS Applied Electronic Materials
Published
2024-11-28
DOI
https://doi.org/10.1021/acsaelm.4c01492
Primary Topic
2D Materials and Applications
Type
article
Field-Weighted Citation Impact
0.00

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article

High Frequency and High Gain Split-Gate Monolayer MoS2 Field Effect Transistor for Common Source Amplifier Circuit

Congxin Xia, Chenhai Shen, Peize Yuan, Xueping Li et al.
ACS Applied Electronic Materials
2D Materials and Applications
article

High Frequency and High Gain Split-Gate Monolayer MoS2 Field Effect Transistor for Common Source Amplifier Circuit

Congxin Xia, Chenhai Shen, Peize Yuan, Xueping Li, Xiaojie Tang, Zhuojun Wang, Jianye Wang
article en

Abstract

For analog systems, the field effect transistor (FET) is regarded as one of the fundamental electronic devices. However, its small gain restricts the application of FET in amplifiers and analog circuits. Here, we design a split-gate FET based on monolayer MoS2 and optimize the key performance index of intrinsic gain (Av0), transconductance frequency product (TFP), and gain frequency product (GFP). The maximum Av0 of 293 V/V and cutoff frequency of hundreds of GHz are obtained by optimizing the control gate positions and input gate voltage. With an equivalent oxide thickness of 0.3 nm, the FET possesses a superior TFP of 7657 GHz/V and GFP of 14148 GHz. In particular, a common source amplifier circuit utilizing the split-gate FET is established, achieving the largest circuit gain of approximately 277 V/V. This work provides a promising route to use split-gate FET to realize a common source amplifier circuit with high circuit gain.

ACS Applied Electronic MaterialsVol. 6(12)
Henan Academy of Sciences (CN), Institute of Physics (CN), Henan Normal University (CN)
National Natural Science Foundation of China, Henan Province Foundation for University Key Teacher
Affordable and clean energy
Openalex Percentile: Top 86%
2D Materials and Applications
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High Frequency and High Gain Split-Gate Monolayer MoS<sub>2</sub> Field Effect Transistor for Common Source Amplifier Circuit — Congxin Xia, Chenhai Shen, et al. · ACS Applied Electronic Materials (2024) | TGRS Research Map | TGRS