Structural and Electrical Properties of Al-Co(Al-N)/AlN-Co Multilayer Films Prepared by Two-Facing-Target Type Sputtering System

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Publication Details

Journal
Korean Journal of Materials Research
Published
2024-10-27
DOI
https://doi.org/10.3740/mrsk.2024.34.10.506
Primary Topic
Copper Interconnects and Reliability
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article
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article

Structural and Electrical Properties of Al-Co(Al-N)/AlN-Co Multilayer Films Prepared by Two-Facing-Target Type Sputtering System

Chang-Suk Han, Chang-Hwan Bae
Korean Journal of Materials Research
Copper Interconnects and Reliability
article

Structural and Electrical Properties of Al-Co(Al-N)/AlN-Co Multilayer Films Prepared by Two-Facing-Target Type Sputtering System

Chang-Suk Han, Chang-Hwan Bae
article en

Abstract

No abstract available for this paper.
Korean Journal of Materials ResearchVol. 34(10)
Hoseo University (KR)
Openalex Percentile: Top 88%
Copper Interconnects and Reliability
DOIOpen Access PDFOpenAlex
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Structural and Electrical Properties of Al-Co(Al-N)/AlN-Co Multilayer Films Prepared by Two-Facing-Target Type Sputtering System — Chang-Suk Han, Chang-Hwan Bae · Korean Journal of Materials Research (2024) | TGRS Research Map | TGRS