Process Mechanics Model and Asymmetric Residual Stress Analysis During 3-D NAND Manufacturing

The advent of 3-D NAND architecture has introduced new integration challenges, particularly regarding the impact of thermal-mechanical stress during manufacturing, which significantly affects device performance. This study establishes a 3-D NAND flash memory process mechanics model using a local representative volume element (RVE) finite element modeling framework. We thoroughly analyze the causes of warpage during the 3-D NAND manufacturing process and monitor the evolution of mechanical stress and related structural deformations. Additionally, we examine the deformation distribution under sequential processes and investigate how different process conditions impact asymmetric deformation. Our findings have potential significance for improving device structure reliability and optimizing process parameters in 3-D NAND memory manufacturing. By providing insights into stress evolution and deformation mechanisms, this work contributes to addressing the challenges associated with increasing storage density in 3-D NAND technology.

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Publication Details

Journal
IEEE Transactions on Electron Devices
Published
2024-11-27
DOI
https://doi.org/10.1109/ted.2024.3496435
Citations
1
Primary Topic
Advanced Surface Polishing Techniques
Type
article
Field-Weighted Citation Impact
0.18

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article

Process Mechanics Model and Asymmetric Residual Stress Analysis During 3-D NAND Manufacturing

Zhiqiang Tian, Gang Zhang, Sheng Liu, Yuhua Huang et al.
1 citations
IEEE Transactions on Electron Devices
Advanced Surface Polishing Techniques
0.18
article

Process Mechanics Model and Asymmetric Residual Stress Analysis During 3-D NAND Manufacturing

Zhiqiang Tian, Gang Zhang, Sheng Liu, Yuhua Huang, Shizhao Wang
article en
1 citations

Abstract

The advent of 3-D NAND architecture has introduced new integration challenges, particularly regarding the impact of thermal-mechanical stress during manufacturing, which significantly affects device performance. This study establishes a 3-D NAND flash memory process mechanics model using a local representative volume element (RVE) finite element modeling framework. We thoroughly analyze the causes of warpage during the 3-D NAND manufacturing process and monitor the evolution of mechanical stress and related structural deformations. Additionally, we examine the deformation distribution under sequential processes and investigate how different process conditions impact asymmetric deformation. Our findings have potential significance for improving device structure reliability and optimizing process parameters in 3-D NAND memory manufacturing. By providing insights into stress evolution and deformation mechanisms, this work contributes to addressing the challenges associated with increasing storage density in 3-D NAND technology.

IEEE Transactions on Electron DevicesVol. 72(1)
Wuhan University (CN), Fuzhou University (CN)
National Key Research and Development Program of China
Openalex Percentile: Top 50%
Advanced Surface Polishing Techniques
0.18
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Process Mechanics Model and Asymmetric Residual Stress Analysis During 3-D NAND Manufacturing — Zhiqiang Tian, Gang Zhang, et al. · IEEE Transactions on Electron Devices (2024) | TGRS Research Map | TGRS