Synthesizing ordered polar patterns in nonpolar SrTiO <sub>3</sub> nanofilms via wrinkle-induced flexoelectricity

Ordered polar structures in oxide nanofilms play a pivotal role in the development of nanoelectronic applications. Hitherto, ordered polar structures have been restricted to a limited number of ferroelectric materials, and there is no effective scheme to induce and manipulate ordered polar patterns in centrosymmetric nonpolar nanofilms due to the absence of spontaneous symmetry breaking. Here, we circumvent these limitations by utilizing the wrinkle-induced strain gradient modulation associated with flexoelectricity as a general means of inducing and manipulating ordered polar patterns in nonpolar nanofilms. Leveraging the surface instability caused by strain mismatch between oxide nanofilms and pre-strained compliant substrate, we successfully fabricate striped SrTiO<sub>3</sub> wrinkles, where well-ordered strain gradients and corresponding periodic polar patterns are readily achieved. Through in-situ piezoresponse force microscopy experiments, we show that the generated polar patterns can be manipulated by varying strain boundaries. Furthermore, the atomistic resolution images and first-principles calculations reveal that such wrinkle-induced ordered polar patterns primarily emerge from the flexoelectric coupling between the local polarization and strain gradients. These findings provide implications for manipulating polar structures by strain gradient and flexoelectric engineering, which in turn enable the realization of nontrivial polar structures in a broader range of materials.

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Publication Details

Journal
Proceedings of the National Academy of Sciences
Published
2024-11-26
DOI
https://doi.org/10.1073/pnas.2414500121
Citations
7
Primary Topic
Advanced Materials and Mechanics
Type
article
Field-Weighted Citation Impact
1.49

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article

Synthesizing ordered polar patterns in nonpolar SrTiO 3 nanofilms via wrinkle-induced flexoelectricity

Shengping Shen, Hongxing Shang, Feng Deng, Lingtong Lv et al.
7 citations
Proceedings of the National Academy of Sciences
Advanced Materials and Mechanics
1.49
article

Synthesizing ordered polar patterns in nonpolar SrTiO 3 nanofilms via wrinkle-induced flexoelectricity

Shengping Shen, Hongxing Shang, Feng Deng, Lingtong Lv, Sheng Tang, Shuling Hu, Liang Xu, Hongyu Cao, Yihan Wu, Xin Zhang, Huiting Dong, Qianqian Ma
article en
7 citations

Abstract

Ordered polar structures in oxide nanofilms play a pivotal role in the development of nanoelectronic applications. Hitherto, ordered polar structures have been restricted to a limited number of ferroelectric materials, and there is no effective scheme to induce and manipulate ordered polar patterns in centrosymmetric nonpolar nanofilms due to the absence of spontaneous symmetry breaking. Here, we circumvent these limitations by utilizing the wrinkle-induced strain gradient modulation associated with flexoelectricity as a general means of inducing and manipulating ordered polar patterns in nonpolar nanofilms. Leveraging the surface instability caused by strain mismatch between oxide nanofilms and pre-strained compliant substrate, we successfully fabricate striped SrTiO<sub>3</sub> wrinkles, where well-ordered strain gradients and corresponding periodic polar patterns are readily achieved. Through in-situ piezoresponse force microscopy experiments, we show that the generated polar patterns can be manipulated by varying strain boundaries. Furthermore, the atomistic resolution images and first-principles calculations reveal that such wrinkle-induced ordered polar patterns primarily emerge from the flexoelectric coupling between the local polarization and strain gradients. These findings provide implications for manipulating polar structures by strain gradient and flexoelectric engineering, which in turn enable the realization of nontrivial polar structures in a broader range of materials.

Proceedings of the National Academy of SciencesVol. 121(49)
Fuzhou University (CN), Xi'an Jiaotong University (CN)
National Natural Science Foundation of China
Openalex Percentile: Top 19%
Advanced Materials and Mechanics
1.49
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