Next-generation DPP EUV light source to support the HVM lithography ecosystem
Energetiq Technology’s existing EQ-10 Electrodeless Z-Pinch™ EUV light source uses xenon plasma to produce 13.5nm (±1% BW) radiation with an EUV power of ~20W/2pi. The source has been widely used for mask and optics inspection as well as resist development in both semiconductor production and research applications. Energetiq is introducing its next-generation EUV source, the EQS-10, which produces an EUV power of > 40W/2pi. The EQS-10 contains new technologies which have been developed and patented, mainly solid-state switching, direct fueling, and adjustable pre-ionization.
Authors
- Kosuke Saito (ORCID: https://orcid.org/0000-0002-1035-3454)
- Daniel Arcaro
- Chris Lee
- F. Niell (ORCID: https://orcid.org/0000-0001-8888-2084)
- D. B. Reisman (ORCID: https://orcid.org/0009-0000-1257-9900)
- Don McDaniel
- Michael L. Roderick (ORCID: https://orcid.org/0000-0002-3630-7739)
- W. Neff
- Samuel K. Moore
Institutions
- Energetiq Technology (United States) (US)
Publication Details
- Published
- 2024-11-26
- DOI
- https://doi.org/10.1117/12.3039288
- Primary Topic
- Advancements in Photolithography Techniques
- Type
- article
- Field-Weighted Citation Impact
- 0.00