UOTe: Kondo‐Interacting Topological Antiferromagnet in a Van der Waals Lattice
Since the initial discovery of 2D van der Waals (vdW) materials, significant effort has been made to incorporate the three properties of magnetism, band structure topology, and strong electron correlations-to leverage emergent quantum phenomena and expand their potential applications. However, the discovery of a single vdW material that intrinsically hosts all three ingredients has remained an outstanding challenge. Here, the discovery of a Kondo-interacting topological antiferromagnet is reported in the vdW 5f electron system UOTe. It has a high antiferromagnetic (AFM) transition temperature of 150 K, with a unique AFM configuration that breaks the combined parity and time reversal (PT) symmetry in an even number of layers while maintaining zero net magnetic moment. This angle-resolved photoemission spectroscopy (ARPES) measurements reveal Dirac bands near the Fermi level, which combined with the theoretical calculations demonstrate UOTe as an AFM Dirac semimetal. Within the AFM order, the presence of the Kondo interaction is observed, as evidenced by the emergence of a 5f flat band near the Fermi level below 100 K and hybridization between the Kondo band and the Dirac band. The density functional theory calculations in its bilayer form predict UOTe as a rare example of a fully-compensated AFM Chern insulator.
Authors
- Tai Kong (ORCID: https://orcid.org/0000-0002-5064-3464)
- Mengke Liu (ORCID: https://orcid.org/0000-0001-6174-0270)
- Philip Kim (ORCID: https://orcid.org/0000-0002-8255-0086)
- Weiwei Xie (ORCID: https://orcid.org/0000-0002-5500-8195)
- Su‐Yang Xu (ORCID: https://orcid.org/0009-0006-6819-3613)
- Gadeer Alqasseri
- Ashvin Vishwanath (ORCID: https://orcid.org/0000-0002-6306-2263)
- Ken H. Guo (ORCID: https://orcid.org/0000-0002-8297-9501)
- Sougata Mardanya (ORCID: https://orcid.org/0000-0002-5821-9908)
- Huibo B. Cao (ORCID: https://orcid.org/0000-0002-5970-4980)
- Yiqing Hao (ORCID: https://orcid.org/0000-0001-5721-3224)
- Jonathan D. Denlinger (ORCID: https://orcid.org/0000-0001-7645-1631)
- Jennifer E. Hoffman (ORCID: https://orcid.org/0000-0003-2752-5379)
- Sugata Chowdhury (ORCID: https://orcid.org/0000-0001-5480-6075)
- Sheng Ran (ORCID: https://orcid.org/0000-0003-1557-267X)
- Christopher Broyles (ORCID: https://orcid.org/0000-0001-9515-8801)
- Junyeong Ahn (ORCID: https://orcid.org/0000-0001-7393-8823)
- Zackary Rehfuss
- Jeremy G. Philbrick (ORCID: https://orcid.org/0000-0002-7917-2280)
- Yang Li (ORCID: https://orcid.org/0000-0002-0327-4221)
- Jiahui Zhu
- Canbing Li (ORCID: https://orcid.org/0000-0001-9116-7487)
- Jalen Garner
- David Luis La Red Martínez (ORCID: https://orcid.org/0000-0003-2038-6468)
- Matt Boswell
- Thao Dinh
Institutions
- Oak Ridge National Laboratory (US)
- Harvard University (US)
- Howard University (US)
- University of Arizona (US)
- Lawrence Berkeley National Laboratory (US)
- Washington University in St. Louis (US)
- Harvard University Press (US)
- Michigan State University (US)
Publication Details
- Journal
- Advanced Materials
- Published
- 2024-11-26
- DOI
- https://doi.org/10.1002/adma.202414966
- Citations
- 4
- Primary Topic
- Topological Materials and Phenomena
- Type
- article
- Field-Weighted Citation Impact
- 1.35
Funders
- National Science Foundation
- Office of Science
- Office of Advanced Cyberinfrastructure
- Basic Energy Sciences
- Air Force Office of Scientific Research
- Energy Frontier Research Centers