The Effect of Heavy-Ion Strikes on Charge Trap Memory Arrays With Analog State Programmability

Single-event effects (SEEs) induced by heavy ions were characterized on 32 distinct conductance states in 40-nm silicon-oxide–nitride-oxide–silicon (SONOS) charge-trap memory. These states were programmed onto three chips, each containing 256K SONOS memory devices in an array that was optimized for analog in-memory computing (IMC) operations. Spatially resolved measurements of heavy-ion effects on analog states reveal that the energy deposited by an ion is distributed across multiple adjacent memory cells, inducing a smooth tail in the memory state distributions. Ion-induced state shifts also show a strong dependence on the electric field across the tunnel oxide. Following radiation, SONOS devices that were struck by heavy ions showed no evidence of permanent damage that led to any observable degradation in long-term data retention properties. This resilience is likely intrinsic to the charge storage mechanism in SONOS memory and helps enable its reliable use in space for both data storage and analog IMC applications.

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Publication Details

Journal
IEEE Transactions on Nuclear Science
Published
2024-11-25
DOI
https://doi.org/10.1109/tns.2024.3505962
Citations
2
Primary Topic
Semiconductor materials and devices
Type
article
Field-Weighted Citation Impact
0.42

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article

The Effect of Heavy-Ion Strikes on Charge Trap Memory Arrays With Analog State Programmability

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2 citations
IEEE Transactions on Nuclear Science
Semiconductor materials and devices
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article

The Effect of Heavy-Ion Strikes on Charge Trap Memory Arrays With Analog State Programmability

Sapan Agarwal, David Russell Hughart, T. Patrick Xiao, A. Alec Talin, Helmut Puchner, Matthew Marinella, Joshua B. Joffrion, Donald Wilson, Rich Dempsey, Christopher H. Bennett, Darlene M. Udoni, Vineet Agrawal
article en
2 citations

Abstract

Single-event effects (SEEs) induced by heavy ions were characterized on 32 distinct conductance states in 40-nm silicon-oxide–nitride-oxide–silicon (SONOS) charge-trap memory. These states were programmed onto three chips, each containing 256K SONOS memory devices in an array that was optimized for analog in-memory computing (IMC) operations. Spatially resolved measurements of heavy-ion effects on analog states reveal that the energy deposited by an ion is distributed across multiple adjacent memory cells, inducing a smooth tail in the memory state distributions. Ion-induced state shifts also show a strong dependence on the electric field across the tunnel oxide. Following radiation, SONOS devices that were struck by heavy ions showed no evidence of permanent damage that led to any observable degradation in long-term data retention properties. This resilience is likely intrinsic to the charge storage mechanism in SONOS memory and helps enable its reliable use in space for both data storage and analog IMC applications.

IEEE Transactions on Nuclear ScienceVol. 72(4)
Sandia National Laboratories California (US), Sandia National Laboratories (US), Infineon Technologies (United States) (US), Arizona State University (US)
Sandia National Laboratories
Affordable and clean energy
Openalex Percentile: Top 36%
Semiconductor materials and devices
0.42
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