Superior P-Type Switching in InSe Nanosheets for Complementary Multifunctional Systems

van der Waals (vdW) indium selenide (InSe) is receiving attention for its exceptional electron mobility and moderate band gap, enabling various applications. However, the intrinsic <i>n</i>-type behavior of InSe has restricted its use predominantly to <i>n</i>-type devices, constraining its application in complementary integrated microsystems. Here, we show superior ambipolar InSe transistors with vdW bottom contacts, achieving impressive <i>p</i>-type on/off current ratios greater than 10<sup>9</sup> and Schottky barrier heights approaching the ideal Schottky-Mott limit. By introducing a partially gate-coupled architecture, we also demonstrate an ambipolar-to-unipolar transition and reconfigurable complementary multifunctionality, including <i>n</i>-type and <i>p</i>-type transistors as well as negative and positive rectifiers and breakdown diodes. The rectification polarity and ratio are gate-tunable from 3.5 × 10<sup>7</sup> down to ∼10 without complex heterostructures, chemical doping, and multigate layouts. The negative and positive breakdowns are reversible, with both the breakdown voltage and switching ratio, which can exceed 10<sup>8</sup>, also being electrically tunable.

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Publication Details

Journal
Nano Letters
Published
2024-11-25
DOI
https://doi.org/10.1021/acs.nanolett.4c04624
Citations
6
Primary Topic
2D Materials and Applications
Type
article
Field-Weighted Citation Impact
0.70

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article

Superior P-Type Switching in InSe Nanosheets for Complementary Multifunctional Systems

Dong‐Il Yeom, Yongwook Seok, Takashi Taniguchi, Kenji Watanabe et al.
6 citations
Nano Letters
2D Materials and Applications
0.70
article

Superior P-Type Switching in InSe Nanosheets for Complementary Multifunctional Systems

Dong‐Il Yeom, Yongwook Seok, Takashi Taniguchi, Kenji Watanabe, Minsu Kim, Kayoung Lee, Jungi Song, Hanbyeol Jang, YiTaek Choi, Y. Ko
article en
6 citations

Abstract

van der Waals (vdW) indium selenide (InSe) is receiving attention for its exceptional electron mobility and moderate band gap, enabling various applications. However, the intrinsic <i>n</i>-type behavior of InSe has restricted its use predominantly to <i>n</i>-type devices, constraining its application in complementary integrated microsystems. Here, we show superior ambipolar InSe transistors with vdW bottom contacts, achieving impressive <i>p</i>-type on/off current ratios greater than 10<sup>9</sup> and Schottky barrier heights approaching the ideal Schottky-Mott limit. By introducing a partially gate-coupled architecture, we also demonstrate an ambipolar-to-unipolar transition and reconfigurable complementary multifunctionality, including <i>n</i>-type and <i>p</i>-type transistors as well as negative and positive rectifiers and breakdown diodes. The rectification polarity and ratio are gate-tunable from 3.5 × 10<sup>7</sup> down to ∼10 without complex heterostructures, chemical doping, and multigate layouts. The negative and positive breakdowns are reversible, with both the breakdown voltage and switching ratio, which can exceed 10<sup>8</sup>, also being electrically tunable.

Nano LettersVol. 24(50)
Korea Advanced Institute of Science and Technology (KR), National Institute for Materials Science (JP), Samsung (South Korea) (KR), Gwangju Institute of Science and Technology (KR)
National Research Foundation of Korea, Samsung, KAIST Creative Research Initiatives
Openalex Percentile: Top 29%
2D Materials and Applications
0.70
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