Displacement Damage and Total Ionizing Dose Induced by 3-MeV Protons in SiC Vertical Power MOSFETs

The radiation effects in SiC power MOSFETs induced by 3-MeV protons at high fluence are evaluated. Significant parametric shifts are observed due to displacement damage (DD) and total ionizing dose (TID) depending on the bias condition and technology generation. Electrical characterizations are used to investigate the <sc xmlns:mml="http://www.w3.org/1998/Math/MathML" xmlns:xlink="http://www.w3.org/1999/xlink">on</small>-state behavior of the MOSFETs. Results revealed a substantial drop of the <sc xmlns:mml="http://www.w3.org/1998/Math/MathML" xmlns:xlink="http://www.w3.org/1999/xlink">on</small>-state current and transconductance induced by DD and charge-carrier compensation at fluences of <inline-formula xmlns:mml="http://www.w3.org/1998/Math/MathML" xmlns:xlink="http://www.w3.org/1999/xlink"> <tex-math notation="LaTeX">$6.72\times 10^{12}$ </tex-math></inline-formula> cm−2 and above, independent of the gate-bias condition during irradiation. The increase in drift resistance and the decrease in gate-drain capacitance indicate effects related to DD in the drift and substrate region of the device, as also supported by technology computer-aided design (TCAD) simulations.

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Publication Details

Journal
IEEE Transactions on Nuclear Science
Published
2024-11-22
DOI
https://doi.org/10.1109/tns.2024.3505058
Citations
4
Primary Topic
Silicon Carbide Semiconductor Technologies
Type
article
Field-Weighted Citation Impact
0.83
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article

Displacement Damage and Total Ionizing Dose Induced by 3-MeV Protons in SiC Vertical Power MOSFETs

H. Goncalves de Medeiros, Ulrike Großner, C. Martinella, A. Paccagnella et al.
4 citations
IEEE Transactions on Nuclear Science
Silicon Carbide Semiconductor Technologies
0.83
article

Displacement Damage and Total Ionizing Dose Induced by 3-MeV Protons in SiC Vertical Power MOSFETs

H. Goncalves de Medeiros, Ulrike Großner, C. Martinella, A. Paccagnella, Simone Gerardin, N. Für, Stefano Bonaldo, Marta Bagatin, V. Gassenmeier
article en
4 citations

Abstract

The radiation effects in SiC power MOSFETs induced by 3-MeV protons at high fluence are evaluated. Significant parametric shifts are observed due to displacement damage (DD) and total ionizing dose (TID) depending on the bias condition and technology generation. Electrical characterizations are used to investigate the <sc xmlns:mml="http://www.w3.org/1998/Math/MathML" xmlns:xlink="http://www.w3.org/1999/xlink">on</small>-state behavior of the MOSFETs. Results revealed a substantial drop of the <sc xmlns:mml="http://www.w3.org/1998/Math/MathML" xmlns:xlink="http://www.w3.org/1999/xlink">on</small>-state current and transconductance induced by DD and charge-carrier compensation at fluences of <inline-formula xmlns:mml="http://www.w3.org/1998/Math/MathML" xmlns:xlink="http://www.w3.org/1999/xlink"> <tex-math notation="LaTeX">$6.72\times 10^{12}$ </tex-math></inline-formula> cm−2 and above, independent of the gate-bias condition during irradiation. The increase in drift resistance and the decrease in gate-drain capacitance indicate effects related to DD in the drift and substrate region of the device, as also supported by technology computer-aided design (TCAD) simulations.

IEEE Transactions on Nuclear ScienceVol. 72(4)
University of Padua (IT), ETH Zurich (CH), Advanced Power Electronics (United States) (US)
Affordable and clean energy
Openalex Percentile: Top 26%
Silicon Carbide Semiconductor Technologies
0.83
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