Low dI<sub>C</sub>/dt noise and on-state voltage 4H-SiC IGBT with N-barrier layer
Abstract A novel 4H-SiC insulated-gate bipolar transistor (IGBT) with an N-barrier layer (NBL) at the top side of the P-shield region is proposed. During the turn-on transient, compared with the conventional grounded asymmetric P-shield trench (GASY) IGBT, the NBL IGBT has lower turn-on d I C / d t and peak turn-on current ( I surge ) due to the introduction of the N-barrier layer. Consequently, the NBL IGBT has lower electromagnetic interference noise based on good turn-on d V / d t controllability. The simulation results show that the reverse recovery d V KA / d t ( V KA is the cathode-anode voltage between the freewheeling diode (FWD), as shown in Fig. 1) of the FWD of the NBL IGBT is 54.6% lower than that of the GASY IGBT for the same turn-on loss ( E ON ). In the on-state, compared with the GASY IGBT, the NBL IGBT has one more channel, and the N-barrier layer also blocks part of the holes. Thus, the conductivity modulation effect can be enhanced and the on-state voltage ( V ON ) can be reduced. The simulation results show that V ON of the NBL IGBT is 14.4% lower than that of the GASY IGBT at 30 A on-state current. In addition, the proposed IGBT has no additional complex structure, so it is simple to manufacture and does not increase the production cost.
Authors
- Xinqiang Wang (ORCID: https://orcid.org/0000-0001-5514-8588)
- Yidan Tang (ORCID: https://orcid.org/0000-0003-3150-9873)
- Xiaoli Tian (ORCID: https://orcid.org/0000-0002-1276-3422)
- Wei Wei
- Yuhao Guo (ORCID: https://orcid.org/0000-0002-5364-3339)
- Yun Bai (ORCID: https://orcid.org/0000-0003-3104-1393)
- Hong Chen (ORCID: https://orcid.org/0000-0001-8854-2020)
- Kunhui Xu (ORCID: https://orcid.org/0009-0001-5881-9858)
- Xinyu Liu (ORCID: https://orcid.org/0009-0008-8239-6294)
Institutions
- Institute of Microelectronics (SG)
- Institute of Microelectronics (CN)
- San’an Optoelectronics (China) (CN)
- University of Chinese Academy of Sciences (CN)
Publication Details
- Journal
- Japanese Journal of Applied Physics
- Published
- 2024-11-22
- DOI
- https://doi.org/10.35848/1347-4065/ad967a
- Citations
- 2
- Primary Topic
- Silicon Carbide Semiconductor Technologies
- Type
- article
- Field-Weighted Citation Impact
- 0.42