Theoretical and Experimental Study of Resistive Thin Film for Application in Resistive Wall Amplifiers

In this paper, the electrical characteristics of resistive thin films and the amplification properties of resistive wall amplifiers are studied based on large signal theory. To optimize amplification performance and reduce interaction length, different frequency bands and operating voltages require films with different electrical properties and thicknesses and a reasonable distribution of the respective lengths of the resistive walls and slow-wave structures. To obtain ZnOx thin films with the required conductivities and thicknesses, reactive DC magnetron sputtering was employed. By controlling the partial pressure of oxygen and the annealing temperature during the preparation process, it is possible to control the number of oxygen deficiencies in the material and the quality of crystallization, which significantly influence the electrical properties. The experiments provide a parameter reference for the preparation of resistive films for millimeter-wave frequency band resistive wall amplifiers.

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Publication Details

Journal
ACS Applied Electronic Materials
Published
2024-11-22
DOI
https://doi.org/10.1021/acsaelm.4c01486
Primary Topic
ZnO doping and properties
Type
article
Field-Weighted Citation Impact
0.00

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article

Theoretical and Experimental Study of Resistive Thin Film for Application in Resistive Wall Amplifiers

Jin Xu, Yongsheng Xu, Pengcheng Yin, Hairong Yin et al.
1 links
ACS Applied Electronic Materials
ZnO doping and properties
article

Theoretical and Experimental Study of Resistive Thin Film for Application in Resistive Wall Amplifiers

Jin Xu, Yongsheng Xu, Pengcheng Yin, Hairong Yin, Jinchi Cai, Lingna Yue, Yue Ouyang, Jun He, Dongdong Jia, Hailong Wang, Wenxiang Wang, Wuyang Fan, Yanyu Wei
article en

Abstract

In this paper, the electrical characteristics of resistive thin films and the amplification properties of resistive wall amplifiers are studied based on large signal theory. To optimize amplification performance and reduce interaction length, different frequency bands and operating voltages require films with different electrical properties and thicknesses and a reasonable distribution of the respective lengths of the resistive walls and slow-wave structures. To obtain ZnOx thin films with the required conductivities and thicknesses, reactive DC magnetron sputtering was employed. By controlling the partial pressure of oxygen and the annealing temperature during the preparation process, it is possible to control the number of oxygen deficiencies in the material and the quality of crystallization, which significantly influence the electrical properties. The experiments provide a parameter reference for the preparation of resistive films for millimeter-wave frequency band resistive wall amplifiers.

ACS Applied Electronic MaterialsVol. 6(12)
University of Electronic Science and Technology of China (CN), Chinese Academy of Sciences (CN), Aerospace Information Research Institute (CN)
National Natural Science Foundation of China, National Key Laboratory Foundation of China, National Postdoctoral Program for Innovative Talents
Openalex Percentile: Top 87%
ZnO doping and properties
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