Electron Cyclotron Resonance Plasma Studies Using the Second Cyclotron Harmonic Resonance

Microwave plasma (generation frequency 2.45 GHz, power 200–1000 W, pressure 0.2–10 mTorr) is excited and maintained in two main modes: (1) at continuous microwave power and low magnetic fields (B = 300–450 G) under a superdense (Ne > Ncr = 7.4 × 1010 cm−3) plasma and low plasma density (Ne < Ncr); and (2) in high magnetic fields (B = 750–1000 G), close to the ECR condition. The peculiarities of plasma generation under the ECR condition and at the second harmonic of cyclotron resonance are studied.

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Publication Details

Journal
Russian Microelectronics
Published
2024-10-01
DOI
https://doi.org/10.1134/s1063739724600353
Primary Topic
Plasma Diagnostics and Applications
Type
article
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article

Electron Cyclotron Resonance Plasma Studies Using the Second Cyclotron Harmonic Resonance

Anatoly Kovalchuk, S. Yu. Shapoval
Russian Microelectronics
Plasma Diagnostics and Applications
article

Electron Cyclotron Resonance Plasma Studies Using the Second Cyclotron Harmonic Resonance

Anatoly Kovalchuk, S. Yu. Shapoval
article en

Abstract

Microwave plasma (generation frequency 2.45 GHz, power 200–1000 W, pressure 0.2–10 mTorr) is excited and maintained in two main modes: (1) at continuous microwave power and low magnetic fields (B = 300–450 G) under a superdense (Ne > Ncr = 7.4 × 1010 cm−3) plasma and low plasma density (Ne < Ncr); and (2) in high magnetic fields (B = 750–1000 G), close to the ECR condition. The peculiarities of plasma generation under the ECR condition and at the second harmonic of cyclotron resonance are studied.

Russian MicroelectronicsVol. 53(5)
Institute of Microelectronics Technology and High Purity Materials (RU)
Affordable and clean energy
Openalex Percentile: Top 81%
Plasma Diagnostics and Applications
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