A Monolithic 40 V/20 A GaN Half Bridge IC with Integrated Gate Drivers and Level-shifters

40 V-rated half-bridges are realized in 100 V Gallium-Nitride on Silicon (GaN-on-Si) and 100 V Gallium-Nitride on Silicon-on-Insulator (GaN-on-SOI) technologies from IMEC. Electrical characterization is done to investigate several key parameters such as on-resistance, gate and drain leakage, and output capacitance. The performance of GaN-on-Si and GaN-on-SOI technologies are compared. In addition, step-stress testing and key parameter drift analysis are performed on the GaN-on-Si half-bridges. Furthermore, a monolithic 40 V/20 A half-bridge with integrated gate drivers, level shifters, floating supplies, and dead time controller circuitry is realized in 100 V GaN-on-Si technology as a part of a point-of-load (PoL) converter achieving 80 % efficiency and reaching an integrated solution with IC active area of 44.15 mm<sup xmlns:mml="http://www.w3.org/1998/Math/MathML" xmlns:xlink="http://www.w3.org/1999/xlink">2</sup> which is 35 % smaller compared to state-of-the-art commercial integrated solutions. Functionality tests are performed for integrated monolithic half-bridge chips. Finally, further testing is done on a system-level Si-GaN hybrid PoL converter.

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Publication Details

Published
2024-09-02
DOI
https://doi.org/10.1109/ecceeurope62508.2024.10751964
Primary Topic
GaN-based semiconductor devices and materials
Type
article
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article

A Monolithic 40 V/20 A GaN Half Bridge IC with Integrated Gate Drivers and Level-shifters

Stefaan Decoutere, Olga Syshchyk, Matteo Borga, Martin Haug et al.
GaN-based semiconductor devices and materials
article

A Monolithic 40 V/20 A GaN Half Bridge IC with Integrated Gate Drivers and Level-shifters

Stefaan Decoutere, Olga Syshchyk, Matteo Borga, Martin Haug, Mahmoud Shousha, Rana Asad Ali, Tuan-Dat Mai, Marc Fossion, Mike Wens, Jef Thoné, Öncü Benli Marin Palomo
article en

Abstract

40 V-rated half-bridges are realized in 100 V Gallium-Nitride on Silicon (GaN-on-Si) and 100 V Gallium-Nitride on Silicon-on-Insulator (GaN-on-SOI) technologies from IMEC. Electrical characterization is done to investigate several key parameters such as on-resistance, gate and drain leakage, and output capacitance. The performance of GaN-on-Si and GaN-on-SOI technologies are compared. In addition, step-stress testing and key parameter drift analysis are performed on the GaN-on-Si half-bridges. Furthermore, a monolithic 40 V/20 A half-bridge with integrated gate drivers, level shifters, floating supplies, and dead time controller circuitry is realized in 100 V GaN-on-Si technology as a part of a point-of-load (PoL) converter achieving 80 % efficiency and reaching an integrated solution with IC active area of 44.15 mm<sup xmlns:mml="http://www.w3.org/1998/Math/MathML" xmlns:xlink="http://www.w3.org/1999/xlink">2</sup> which is 35 % smaller compared to state-of-the-art commercial integrated solutions. Functionality tests are performed for integrated monolithic half-bridge chips. Finally, further testing is done on a system-level Si-GaN hybrid PoL converter.

Thales (Belgium) (BE), IMEC (BE), Würth Elektronik (Germany) (DE)
Openalex Percentile: Top 87%
GaN-based semiconductor devices and materials
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