A Monolithic 40 V/20 A GaN Half Bridge IC with Integrated Gate Drivers and Level-shifters
40 V-rated half-bridges are realized in 100 V Gallium-Nitride on Silicon (GaN-on-Si) and 100 V Gallium-Nitride on Silicon-on-Insulator (GaN-on-SOI) technologies from IMEC. Electrical characterization is done to investigate several key parameters such as on-resistance, gate and drain leakage, and output capacitance. The performance of GaN-on-Si and GaN-on-SOI technologies are compared. In addition, step-stress testing and key parameter drift analysis are performed on the GaN-on-Si half-bridges. Furthermore, a monolithic 40 V/20 A half-bridge with integrated gate drivers, level shifters, floating supplies, and dead time controller circuitry is realized in 100 V GaN-on-Si technology as a part of a point-of-load (PoL) converter achieving 80 % efficiency and reaching an integrated solution with IC active area of 44.15 mm<sup xmlns:mml="http://www.w3.org/1998/Math/MathML" xmlns:xlink="http://www.w3.org/1999/xlink">2</sup> which is 35 % smaller compared to state-of-the-art commercial integrated solutions. Functionality tests are performed for integrated monolithic half-bridge chips. Finally, further testing is done on a system-level Si-GaN hybrid PoL converter.
Authors
- Stefaan Decoutere (ORCID: https://orcid.org/0000-0001-6632-6239)
- Olga Syshchyk (ORCID: https://orcid.org/0000-0001-8110-3754)
- Matteo Borga (ORCID: https://orcid.org/0000-0003-3087-6612)
- Martin Haug (ORCID: https://orcid.org/0000-0003-3136-8724)
- Mahmoud Shousha (ORCID: https://orcid.org/0000-0003-4692-2513)
- Rana Asad Ali
- Tuan-Dat Mai
- Marc Fossion
- Mike Wens (ORCID: https://orcid.org/0000-0003-1039-3410)
- Jef Thoné
- Öncü Benli Marin Palomo
Institutions
- Thales (Belgium) (BE)
- IMEC (BE)
- Würth Elektronik (Germany) (DE)
Publication Details
- Published
- 2024-09-02
- DOI
- https://doi.org/10.1109/ecceeurope62508.2024.10751964
- Primary Topic
- GaN-based semiconductor devices and materials
- Type
- article
- Field-Weighted Citation Impact
- 0.00