Thermally stable Bi2Te3/WSe2 Van Der Waals contacts for pMOSFETs application

Novel van der Waals (vdW) contacts formed by layered Bi<sub>2</sub>Te<sub>3</sub> are found effective in improving the performance of WSe<sub>2</sub> pMOSFETs. As compared with conventional transition metal-based Ni/Au S/D contacts, over 10<sup>3</sup> times on-state current improvement is achieved. vdW interface formation between Bi<sub>2</sub>Te<sub>3</sub> and WSe<sub>2</sub> is confirmed by X-ray diffraction analysis and scanning transmission electron microscope observation. An atomically flat Bi<sub>2</sub>Te<sub>3</sub>/WSe<sub>2</sub> vdW interface, where the number of defects could be reduced as small as possible, contributes to the suppression of Fermi-level pinning caused by defect-induced gap states. Moreover, the semimetal-like characteristics of Bi<sub>2</sub>Te<sub>3</sub> are also effective in minimizing the impact of metal-induced gap states. These features offer WSe<sub>2</sub> pMOSFETs with exceptional S/D junction characteristics, including suppressed off-state leakage and a higher on-off ratio. In addition, it is found that WSe<sub>2</sub> pMOSFETs with Bi<sub>2</sub>Te<sub>3</sub> S/D contacts have excellent thermal stability, maintaining device performance even after 400 °C annealing, which is very promising for CMOS back-end-of-line application. The layered tellurides, reconciling low contact resistance and high thermal stability, are promising, particularly from the perspective of their application in the manufacturing process.

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Publication Details

Journal
Scientific Reports
Published
2024-11-19
DOI
https://doi.org/10.1038/s41598-024-79750-z
Citations
5
Primary Topic
2D Materials and Applications
Type
article
Field-Weighted Citation Impact
0.59

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article

Thermally stable Bi2Te3/WSe2 Van Der Waals contacts for pMOSFETs application

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Scientific Reports
2D Materials and Applications
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article

Thermally stable Bi2Te3/WSe2 Van Der Waals contacts for pMOSFETs application

Yasumitsu Miyata, Takahiko Endo, Wen-Hsin Chang, Shogo Hatayama, Toshifumi Irisawa, Yuta Saito, Naoya Okada
article en
5 citations

Abstract

Novel van der Waals (vdW) contacts formed by layered Bi<sub>2</sub>Te<sub>3</sub> are found effective in improving the performance of WSe<sub>2</sub> pMOSFETs. As compared with conventional transition metal-based Ni/Au S/D contacts, over 10<sup>3</sup> times on-state current improvement is achieved. vdW interface formation between Bi<sub>2</sub>Te<sub>3</sub> and WSe<sub>2</sub> is confirmed by X-ray diffraction analysis and scanning transmission electron microscope observation. An atomically flat Bi<sub>2</sub>Te<sub>3</sub>/WSe<sub>2</sub> vdW interface, where the number of defects could be reduced as small as possible, contributes to the suppression of Fermi-level pinning caused by defect-induced gap states. Moreover, the semimetal-like characteristics of Bi<sub>2</sub>Te<sub>3</sub> are also effective in minimizing the impact of metal-induced gap states. These features offer WSe<sub>2</sub> pMOSFETs with exceptional S/D junction characteristics, including suppressed off-state leakage and a higher on-off ratio. In addition, it is found that WSe<sub>2</sub> pMOSFETs with Bi<sub>2</sub>Te<sub>3</sub> S/D contacts have excellent thermal stability, maintaining device performance even after 400 °C annealing, which is very promising for CMOS back-end-of-line application. The layered tellurides, reconciling low contact resistance and high thermal stability, are promising, particularly from the perspective of their application in the manufacturing process.

Scientific ReportsVol. 14(1)
Tokyo Metropolitan University (JP), National Institute of Advanced Industrial Science and Technology (JP)
Japan Society for the Promotion of Science, National Institute of Information and Communications Technology, Core Research for Evolutional Science and Technology, JST-Mirai Program, Fusion Oriented REsearch for disruptive Science and Technology
Openalex Percentile: Top 33%
2D Materials and Applications
0.59
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