Thermally stable Bi2Te3/WSe2 Van Der Waals contacts for pMOSFETs application
Novel van der Waals (vdW) contacts formed by layered Bi<sub>2</sub>Te<sub>3</sub> are found effective in improving the performance of WSe<sub>2</sub> pMOSFETs. As compared with conventional transition metal-based Ni/Au S/D contacts, over 10<sup>3</sup> times on-state current improvement is achieved. vdW interface formation between Bi<sub>2</sub>Te<sub>3</sub> and WSe<sub>2</sub> is confirmed by X-ray diffraction analysis and scanning transmission electron microscope observation. An atomically flat Bi<sub>2</sub>Te<sub>3</sub>/WSe<sub>2</sub> vdW interface, where the number of defects could be reduced as small as possible, contributes to the suppression of Fermi-level pinning caused by defect-induced gap states. Moreover, the semimetal-like characteristics of Bi<sub>2</sub>Te<sub>3</sub> are also effective in minimizing the impact of metal-induced gap states. These features offer WSe<sub>2</sub> pMOSFETs with exceptional S/D junction characteristics, including suppressed off-state leakage and a higher on-off ratio. In addition, it is found that WSe<sub>2</sub> pMOSFETs with Bi<sub>2</sub>Te<sub>3</sub> S/D contacts have excellent thermal stability, maintaining device performance even after 400 °C annealing, which is very promising for CMOS back-end-of-line application. The layered tellurides, reconciling low contact resistance and high thermal stability, are promising, particularly from the perspective of their application in the manufacturing process.
Authors
- Yasumitsu Miyata (ORCID: https://orcid.org/0000-0002-9733-5119)
- Takahiko Endo (ORCID: https://orcid.org/0000-0002-6520-6048)
- Wen-Hsin Chang (ORCID: https://orcid.org/0000-0002-8501-6276)
- Shogo Hatayama (ORCID: https://orcid.org/0000-0002-2914-1072)
- Toshifumi Irisawa
- Yuta Saito (ORCID: https://orcid.org/0000-0002-9576-1560)
- Naoya Okada (ORCID: https://orcid.org/0000-0002-0512-8324)
Institutions
- Tokyo Metropolitan University (JP)
- National Institute of Advanced Industrial Science and Technology (JP)
Publication Details
- Journal
- Scientific Reports
- Published
- 2024-11-19
- DOI
- https://doi.org/10.1038/s41598-024-79750-z
- Citations
- 5
- Primary Topic
- 2D Materials and Applications
- Type
- article
- Field-Weighted Citation Impact
- 0.59
Funders
- Japan Society for the Promotion of Science
- National Institute of Information and Communications Technology
- Core Research for Evolutional Science and Technology
- JST-Mirai Program
- Fusion Oriented REsearch for disruptive Science and Technology