Highly Robust p-GaN Gate HEMT With Surge-Energy Ruggedness Under Unclamped Inductive Switching and UV Pulse Laser Irradiation
The robustness of non-avalanche p-GaN gate HEMTs against dynamic overvoltage (<inline-formula xmlns:mml="http://www.w3.org/1998/Math/MathML" xmlns:xlink="http://www.w3.org/1999/xlink"> <tex-math notation="LaTeX">${V}_{\text {over.}}\text {)}$ </tex-math></inline-formula> and transient surge-energy (<inline-formula xmlns:mml="http://www.w3.org/1998/Math/MathML" xmlns:xlink="http://www.w3.org/1999/xlink"> <tex-math notation="LaTeX">${E}_{\text {sur.}}\text {)}$ </tex-math></inline-formula> shocks is critical for device applications, especially for high-power switching applications. In this work, by carefully constructing an energy dissipating passage from the drain to the source, the proposed device successfully possesses the ability to withstand dynamic overvoltage and safely dissipate surge energy, achieving a maximum <inline-formula xmlns:mml="http://www.w3.org/1998/Math/MathML" xmlns:xlink="http://www.w3.org/1999/xlink"> <tex-math notation="LaTeX">${V}_{\text {over.}}$ </tex-math></inline-formula> of 1.85 kV and an <inline-formula xmlns:mml="http://www.w3.org/1998/Math/MathML" xmlns:xlink="http://www.w3.org/1999/xlink"> <tex-math notation="LaTeX">${E}_{\text {sur.}}$ </tex-math></inline-formula> of 11.7 J/cm2, setting a performance record for GaN-based devices. Furthermore, the device sustains over 1-million times repeated UIS energy shocks, revealing strong robustness. In particular, under extreme conditions of UV pulse laser irradiation and inductive transient, the device still exhibits notable survivability. These results reveal the great potential of non-avalanche p-GaN HEMTs with surge energy dissipating and overvoltage sustaining capabilities for high-power switching applications.
Authors
- Dunjun Chen (ORCID: https://orcid.org/0000-0002-1363-1413)
- Weizong Xu (ORCID: https://orcid.org/0000-0001-5243-4984)
- Hai Lu (ORCID: https://orcid.org/0000-0002-9835-6763)
- Rong Yu (ORCID: https://orcid.org/0000-0003-2520-0677)
- Dong Zhou (ORCID: https://orcid.org/0000-0003-0410-1581)
- Feng Zhou (ORCID: https://orcid.org/0000-0002-3159-0328)
- Rong Zhang (ORCID: https://orcid.org/0000-0003-0015-6331)
- Fangfang Ren (ORCID: https://orcid.org/0000-0001-5598-9512)
- Tianyang Zhou (ORCID: https://orcid.org/0009-0009-2871-6610)
- Youdou Zheng
- Can Zou
Institutions
- Collaborative Innovation Center of Advanced Microstructures (CN)
- Nanjing University (CN)
Publication Details
- Journal
- IEEE Electron Device Letters
- Published
- 2024-11-18
- DOI
- https://doi.org/10.1109/led.2024.3501073
- Citations
- 4
- Primary Topic
- GaN-based semiconductor devices and materials
- Type
- article
- Field-Weighted Citation Impact
- 1.24
Funders
- National Natural Science Foundation of China
- Jiangsu Provincial Key Research and Development Program
- National Key Research and Development Program of China