An OLED display fabricated through side‐by‐side pixel patterning via photolithography
Abstract We developed a patterning technology using photolithography that eliminates the need for a fine metal mask, thereby achieving high resolution across all red‐blue‐green pixels of an organic light‐emitting diode (OLED) display. Traditional methods using fine metal masks typically restrict the resolution and size of a display. However, the proposed technology largely bypasses these constraints. Suitable for OLED applications ranging from microdisplays in augmented reality and virtual reality to large TVs exceeding 80 in., our technology overcomes limitations on alignment accuracy, fine metal mask washing, and running costs and paves the way for mass production in OLED manufacturing.
Authors
- Akihiro Chida
- Koji Kusunoki
- Yasumasa Yamane (ORCID: https://orcid.org/0009-0008-3519-6687)
- Shunpei Yamazaki (ORCID: https://orcid.org/0000-0001-6055-8987)
- Satoru Idojiri
- Ken‐ichi Okazaki (ORCID: https://orcid.org/0000-0003-0800-712X)
- Shingo Eguchi (ORCID: https://orcid.org/0009-0003-7823-3074)
- Takayuki Oide
- Yasutaka Nakazawa
- Sho Kato
Institutions
- Semiconductor Energy Laboratory (Japan) (JP)
Publication Details
- Journal
- Journal of the Society for Information Display
- Published
- 2024-11-15
- DOI
- https://doi.org/10.1002/jsid.2019
- Citations
- 2
- Primary Topic
- Thin-Film Transistor Technologies
- Type
- article
- Field-Weighted Citation Impact
- 0.42