Protective Ni composite film on Cu prepared by inverse-replacement reaction

Abstract In high concentrated thiourea solution, Ni composite film was directly deposited onto Cu via inverse-replacement reaction of Ni 2+ by Cu. Significantly, X-ray photoelectron spectroscopy further demonstrated that the Ni composite film was Ni-S alloy doped with thiourea and Cu 2 O. Traces of thiourea and the doping of Cu 2 O in the film should play a promotional role in the improvement of anti-corrosion performance. Therefore, electrochemical measurements and high-temperature oxidation test indicated that the Ni composite film could be a cost-effective and efficiently anti-corrosion coating on the Cu substrate with sufficiently high corrosion resistance.

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Publication Details

Journal
Journal of Physics Conference Series
Published
2024-11-01
DOI
https://doi.org/10.1088/1742-6596/2888/1/012011
Primary Topic
Copper Interconnects and Reliability
Type
article
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article

Protective Ni composite film on Cu prepared by inverse-replacement reaction

Dong Tian, Fangquan Xia, Ying Liu, Deyu Li et al.
Journal of Physics Conference Series
Copper Interconnects and Reliability
article

Protective Ni composite film on Cu prepared by inverse-replacement reaction

Dong Tian, Fangquan Xia, Ying Liu, Deyu Li, Ning Li, Xianran Xing
article en

Abstract

Abstract In high concentrated thiourea solution, Ni composite film was directly deposited onto Cu via inverse-replacement reaction of Ni 2+ by Cu. Significantly, X-ray photoelectron spectroscopy further demonstrated that the Ni composite film was Ni-S alloy doped with thiourea and Cu 2 O. Traces of thiourea and the doping of Cu 2 O in the film should play a promotional role in the improvement of anti-corrosion performance. Therefore, electrochemical measurements and high-temperature oxidation test indicated that the Ni composite film could be a cost-effective and efficiently anti-corrosion coating on the Cu substrate with sufficiently high corrosion resistance.

Journal of Physics Conference SeriesVol. 2888(1)
Harbin Institute of Technology (CN), University of Jinan (CN), Luye Pharma (China) (CN)
Openalex Percentile: Top 88%
Copper Interconnects and Reliability
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