Modified <scp>Si<sub>3</sub>N<sub>4</sub></scp> filler enhancing the energy storage performance and thermal stability of a P(<scp>VDF</scp>‐<scp>HFP</scp>) based composite

Abstract To improve the high‐temperature stability of poly(vinylidene fluoride hexafluoropropylene) P(VDF‐HFP)‐based composite film for its potential application in energy storage, the modified silicon nitride (mSi 3 N 4 ) nanoparticles are fabricated using silane coupling agent (KH‐570) and introduced into P(VDF‐HFP). When the mass fraction of mSi 3 N 4 is 7.5 wt%, the recoverable energy density ( W rec ) of the mSi 3 N 4 / P(VDF‐HFP) composite film reaches to 1.79 J/cm 3 under a 125 MV/m electric field, which is 82.7% higher than pure P(VDF‐HFP). Interestingly, the dielectric properties of mSi 3 N 4 /P(VDF‐HFP) show a considerable thermal stability at a high‐frequency ranging from −20 to 160°C, providing an effective approach for preparing energy storage composites working for high‐temperature environments.

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Publication Details

Journal
Journal of Applied Polymer Science
Published
2024-11-12
DOI
https://doi.org/10.1002/app.56472
Primary Topic
Dielectric materials and actuators
Type
article
Field-Weighted Citation Impact
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article

Modified Si3N4 filler enhancing the energy storage performance and thermal stability of a P(VDF‐HFP) based composite

Zi Yang, Weimin Xia, Xinyi Zhang, Shiyu Zhang et al.
Journal of Applied Polymer Science
Dielectric materials and actuators
article

Modified Si3N4 filler enhancing the energy storage performance and thermal stability of a P(VDF‐HFP) based composite

Zi Yang, Weimin Xia, Xinyi Zhang, Shiyu Zhang, Xiaofang Zhang
article en

Abstract

Abstract To improve the high‐temperature stability of poly(vinylidene fluoride hexafluoropropylene) P(VDF‐HFP)‐based composite film for its potential application in energy storage, the modified silicon nitride (mSi 3 N 4 ) nanoparticles are fabricated using silane coupling agent (KH‐570) and introduced into P(VDF‐HFP). When the mass fraction of mSi 3 N 4 is 7.5 wt%, the recoverable energy density ( W rec ) of the mSi 3 N 4 / P(VDF‐HFP) composite film reaches to 1.79 J/cm 3 under a 125 MV/m electric field, which is 82.7% higher than pure P(VDF‐HFP). Interestingly, the dielectric properties of mSi 3 N 4 /P(VDF‐HFP) show a considerable thermal stability at a high‐frequency ranging from −20 to 160°C, providing an effective approach for preparing energy storage composites working for high‐temperature environments.

Journal of Applied Polymer ScienceVol. 142(6)
Xi’an University (CN), Xi'an University of Technology (CN)
National Natural Science Foundation of China, Education Department of Shaanxi Province, National Key Research and Development Program of China
Affordable and clean energy
Openalex Percentile: Top 81%
Dielectric materials and actuators
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