Intrinsically Photopatternable High‐k Polymer Dielectric for Flexible Electronics (Adv. Funct. Mater. 47/2024)
Flexible Electronics In article number 2405530, Hyun You Kim, Hyun-Suk Kim, Kyung Jin Lee, and co-workers present a parylene-OH polymeric thin film, synthesized via a CVD process, that exhibits unique intrinsic photo-patternable properties, offering exceptional dielectric performance and flexible durability. The illustration suggests that parylene-OH deposited through CVD can be easily photo-patterned by simply irradiating it with 254 nm UV light, followed by an organic solvent rinse, resulting in high-resolution patterning.
Authors
- Hyukmin Kweon (ORCID: https://orcid.org/0009-0005-0329-511X)
- Hyun You Kim (ORCID: https://orcid.org/0000-0001-8105-1640)
- Gunoh Lee
- Hyuk Choi (ORCID: https://orcid.org/0000-0002-7899-2631)
- Ju Hyeok Lee
- Byeongil Noh
- Seong Cheol Jang (ORCID: https://orcid.org/0000-0002-1638-2096)
- Hyun‐Suk Kim (ORCID: https://orcid.org/0000-0003-4286-7027)
- Kyung Jin Lee (ORCID: https://orcid.org/0000-0002-6709-3235)
- Do Hwan Kim (ORCID: https://orcid.org/0000-0003-3003-8125)
- Jimin Park (ORCID: https://orcid.org/0000-0002-8870-1228)
Institutions
- Chungnam National University (KR)
- Dongguk University (KR)
- Hanyang University (KR)
Publication Details
- Journal
- Advanced Functional Materials
- Published
- 2024-11-01
- DOI
- https://doi.org/10.1002/adfm.202470280
- Citations
- 6
- Primary Topic
- Synthesis and properties of polymers
- Type
- article
- Field-Weighted Citation Impact
- 1.01