Methodology of Production of Photo-Sensitive Elements on Ptsi Basis

Schottky barrier diodes based on PtSi-Si contact can be used as detectors for registration of radiation in the infrared spectral region. However, the quantum efficiency of such receivers is very low compared to photodetectors based on narrow-gap semiconductors and p-n junctions. To increase the quantum efficiency of Schottky receivers, as it will be shown below, they are made in the form of the so-called “optical cavity”, and the thickness of PtSi should not exceed 100 A0. For this purpose we have developed a technological mode of multilayer metallization to obtain thin PtSi-Si contacts.

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Publication Details

Journal
Микроэлектроника
Published
2024-11-13
DOI
https://doi.org/10.31857/s0544126924040053
Primary Topic
Electron and X-Ray Spectroscopy Techniques
Type
article
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article

Methodology of Production of Photo-Sensitive Elements on Ptsi Basis

É. A. Kerimov
Микроэлектроника
Electron and X-Ray Spectroscopy Techniques
article

Methodology of Production of Photo-Sensitive Elements on Ptsi Basis

É. A. Kerimov
article en

Abstract

Schottky barrier diodes based on PtSi-Si contact can be used as detectors for registration of radiation in the infrared spectral region. However, the quantum efficiency of such receivers is very low compared to photodetectors based on narrow-gap semiconductors and p-n junctions. To increase the quantum efficiency of Schottky receivers, as it will be shown below, they are made in the form of the so-called “optical cavity”, and the thickness of PtSi should not exceed 100 A0. For this purpose we have developed a technological mode of multilayer metallization to obtain thin PtSi-Si contacts.

МикроэлектроникаVol. 53(4)
Azerbaijan Technical University (AZ)
Affordable and clean energy
Openalex Percentile: Top 81%
Electron and X-Ray Spectroscopy Techniques
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