ASM-GaN Model for Resistive Mixer Applications at D-Band Frequencies

This paper reports on the large-signal modeling of AlGaN/GaN high-electron-mobility-transistors. The physicsbased model parameters of the Advanced SPICE Model are used to accurately reproduce the large-signal behavior of different gate length GaN HEMTs even with varying gate-drain and gatesource ledges focusing on passive mixer applications at D-band frequencies (110 - 170 GHz). Dedicated models for 70 nm GaN HEMTs and 100 nm GaN HEMTs with different ledge distances are presented. All models show an excellent agreement with dc and S-parameter measurements of single HEMT devices up to 150 GHz. Furthermore, the 100 nm GaN HEMT model is verified based on an existing resistive D-band mixer MMIC. This shows that the model offers the option to analyze trends in circuit performance (e.g. linearity) when key technology parameters such as the gate length are varied.

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Published
2024-10-27
DOI
https://doi.org/10.1109/bcicts59662.2024.10745699
Citations
1
Primary Topic
GaN-based semiconductor devices and materials
Type
article
Field-Weighted Citation Impact
0.31
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ASM-GaN Model for Resistive Mixer Applications at D-Band Frequencies

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ASM-GaN Model for Resistive Mixer Applications at D-Band Frequencies

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article en
1 citations

Abstract

This paper reports on the large-signal modeling of AlGaN/GaN high-electron-mobility-transistors. The physicsbased model parameters of the Advanced SPICE Model are used to accurately reproduce the large-signal behavior of different gate length GaN HEMTs even with varying gate-drain and gatesource ledges focusing on passive mixer applications at D-band frequencies (110 - 170 GHz). Dedicated models for 70 nm GaN HEMTs and 100 nm GaN HEMTs with different ledge distances are presented. All models show an excellent agreement with dc and S-parameter measurements of single HEMT devices up to 150 GHz. Furthermore, the 100 nm GaN HEMT model is verified based on an existing resistive D-band mixer MMIC. This shows that the model offers the option to analyze trends in circuit performance (e.g. linearity) when key technology parameters such as the gate length are varied.

University of Freiburg (DE), Fraunhofer Institute for Applied Solid State Physics (DE)
Openalex Percentile: Top 42%
GaN-based semiconductor devices and materials
0.31
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