The synthesis, characterization, and thermal properties of a titanium (III) amidinate compound and its potential as a single chemical vapor deposition precursor for N/C-doped TiO2 film

A titanium(III) amidinate compound had been successfully obtained using a salt elimination reaction between TiCl3(3THF) and [Li(i Prn BuAMD)] in a 65% yield, and the characterization of the compound was conducted using various characterization methods. The reported compound’s thermal performances were studied through thermal gravimetric analysis (TGA), and the result indicated that the reported titanium(III) amidinate compound exhibited a suitable volatility, high thermal stability, and sufficient vapor pressure. Furthermore, film material deposit was performed in a CVD reactor under low pressure, and a N/C-doped TiO2 film was successfully deposited.