Work-Function-Dependent Reduction of Transition Metal Nitrides in Hydrogen Environments

Amidst the growing importance of hydrogen in a sustainable future, it is crucial to develop coatings that can protect hydrogen-sensitive system components in reactive hydrogen environments. However, the prediction of the chemical stability of materials in hydrogen is not fully understood. In this study, we show that the work function is a key parameter determining the reducibility (i.e., denitridation) of transition metal nitrides (TMNs) in hydrogen radicals (H*) at elevated temperatures. We demonstrate that, when the work function of a TMN system drops below a threshold limit (ϕ<sub>TH</sub>), its reduction effectively stops. We propose that this is due to the preferential binding of H* to transition metal (TM) atoms rather than N atoms, which makes the formation of volatile species (NH<sub><i>x</i></sub>) unfavorable. This finding provides a novel perspective for comprehending the interaction of hydrogen with TM compounds and allows prediction of the chemical stability of hydrogen-protective coatings.

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Publication Details

Journal
The Journal of Physical Chemistry Letters
Published
2024-11-08
DOI
https://doi.org/10.1021/acs.jpclett.4c02259
Citations
2
Primary Topic
Semiconductor materials and devices
Type
article
Field-Weighted Citation Impact
0.42

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article

Work-Function-Dependent Reduction of Transition Metal Nitrides in Hydrogen Environments

Marcelo Ackermann, Robbert Wilhelmus Elisabeth van de Kruijs, Jacobus M. Sturm, Wesley T. E. van den Beld et al.
2 citations
The Journal of Physical Chemistry Letters
Semiconductor materials and devices
0.42
article

Work-Function-Dependent Reduction of Transition Metal Nitrides in Hydrogen Environments

Marcelo Ackermann, Robbert Wilhelmus Elisabeth van de Kruijs, Jacobus M. Sturm, Wesley T. E. van den Beld, Abdul Rehman
article en
2 citations

Abstract

Amidst the growing importance of hydrogen in a sustainable future, it is crucial to develop coatings that can protect hydrogen-sensitive system components in reactive hydrogen environments. However, the prediction of the chemical stability of materials in hydrogen is not fully understood. In this study, we show that the work function is a key parameter determining the reducibility (i.e., denitridation) of transition metal nitrides (TMNs) in hydrogen radicals (H*) at elevated temperatures. We demonstrate that, when the work function of a TMN system drops below a threshold limit (ϕ<sub>TH</sub>), its reduction effectively stops. We propose that this is due to the preferential binding of H* to transition metal (TM) atoms rather than N atoms, which makes the formation of volatile species (NH<sub><i>x</i></sub>) unfavorable. This finding provides a novel perspective for comprehending the interaction of hydrogen with TM compounds and allows prediction of the chemical stability of hydrogen-protective coatings.

The Journal of Physical Chemistry LettersVol. 15(46)
University of Twente (NL)
Carl-Zeiss-Stiftung, University of Twente, Nederlandse Organisatie voor Wetenschappelijk Onderzoek, ASML
Openalex Percentile: Top 37%
Semiconductor materials and devices
0.42
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