Oriented Bi2Te3-based films enabled high performance planar thermoelectric cooling device for hot spot elimination
Film-thermoelectric cooling devices are expected to provide a promising active thermal management solution with the continues increase of the power density of integrated circuit chips and other electronic devices. However, because the microstructure-related performance of thermoelectric films has not been perfectly matched with the device configuration, the potential of planar devices on chip heat dissipation has still not been fully exploited. Here, by liquid Te assistant growth method, highly (00 l) orientated Bi<sub>2</sub>Te<sub>3</sub>-based films which is comparable to single crystals are obtained in polycrystal films in this work. The high mobility stem from high orientation and low lattice thermal conductivity resulting from excess Te induced staggered stacking faults leads to high in-plane zT values ~1.53 and ~1.10 for P-type Bi<sub>0.4</sub>Sb<sub>1.6</sub>Te<sub>3</sub> and N-type Bi<sub>2</sub>Te<sub>3</sub> films, respectively. The planar devices basing on the geometrically designed high orientation films produce a remarkable temperature reduction of ~8.2 K in the hot spot elimination experiment, demonstrating the great benefit of Te assistant growth method for oriented planar Bi<sub>2</sub>Te<sub>3</sub> films and planar devices devices design, and also bring great enlightenment to the next generation active thermal management for integrated circuits.
Authors
- Juan Li (ORCID: https://orcid.org/0000-0003-4419-5391)
- Qiyong Chen (ORCID: https://orcid.org/0009-0004-9948-2878)
- Guoying Dong
- Yuxuan Yang
- Jibao Lu (ORCID: https://orcid.org/0000-0002-3621-5404)
- Jianghe Feng (ORCID: https://orcid.org/0000-0003-1640-4221)
- Ruiheng Liu (ORCID: https://orcid.org/0000-0003-3855-4052)
- Guojuan Qiu (ORCID: https://orcid.org/0000-0002-5527-3781)
- Yixin Qiao (ORCID: https://orcid.org/0000-0001-6387-3130)
- Guijuan Li
- Lili Xi (ORCID: https://orcid.org/0000-0003-3173-5547)
- Rong Sun (ORCID: https://orcid.org/0000-0002-9252-5132)
- Haijun Wu (ORCID: https://orcid.org/0000-0002-7303-379X)
- Long Chen (ORCID: https://orcid.org/0000-0001-5907-6374)
- Xiong Yang
- Yifeng Ling
Institutions
- Shanghai University (CN)
- Chinese Academy of Sciences (CN)
- Shenzhen Institutes of Advanced Technology (CN)
- Xi'an Jiaotong University (CN)
Publication Details
- Journal
- Nature Communications
- Published
- 2024-11-08
- DOI
- https://doi.org/10.1038/s41467-024-54017-3
- Citations
- 32
- Primary Topic
- Advanced Thermoelectric Materials and Devices
- Type
- article
- Field-Weighted Citation Impact
- 3.75
Funders
- National Natural Science Foundation of China
- Fuzhou University