Silver-Tungsten induced codeposition: Influence of pH and carboxylic acid form in a DMH-based electrolyte

• Silver-tungsten coatings were successfully electrodeposited from DMH electrolyte • Tungsten contents close to optimal for functional properties without thiourea. • The induced codeposition mechanism is coherent with an intermediate bimetallic complex • Silver ion reduction is under mass transport control and tungsten under kinetic • No silver-tungsten reduction was possible with less than two protonated carboxyl groups Silver-tungsten coatings were successfully electrodeposited on platinum and copper substrates from a non-toxic 5.5-dimethylhydantoin electrolyte at low pH and two different carboxylic acid forms: citrate or tartrate. Tungsten contents remain at low levels compared to former works, but close to the values considered as optimal for functional properties without having to recourse to controversial substances such as thiourea. Electrochemical studies by linear sweep voltammetry allow to distinguish two typical behaviors and give interesting insight into the induced codeposition mechanism. Silver-tungsten codeposition only occurred at pH 2.0 and 3.5 using citrates and at pH 2.0 using tartrates, corresponding to the forms H 3 Cit, H 2 Cit -2 , and H 2 Tar, respectively. No silver-tungsten reduction was possible with less than two protonated carboxyl groups on either tartrate or citrate ions. Separate silver and tungsten lattice are both present in the resulting alloy. Grain and crystallite sizes were observed by SEM. XPS investigations show that for our low W content alloys, silver is found to be metallic whereas tungsten is present in oxide form. The carbon peaks and also gaps between peaks when N is absent indicate that citrates are present in the coating, unlike DMH.

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Publication Details

Journal
Electrochimica Acta
Published
2024-11-08
DOI
https://doi.org/10.1016/j.electacta.2024.145335
Citations
1
Primary Topic
Semiconductor materials and devices
Type
article
Field-Weighted Citation Impact
0.21
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article

Silver-Tungsten induced codeposition: Influence of pH and carboxylic acid form in a DMH-based electrolyte

Jean‐Yves Hihn, Joffrey Tardelli, Anna Krystianiak, Quentin Orecchioni et al.
1 citations
Electrochimica Acta
Semiconductor materials and devices
0.21
article

Silver-Tungsten induced codeposition: Influence of pH and carboxylic acid form in a DMH-based electrolyte

Jean‐Yves Hihn, Joffrey Tardelli, Anna Krystianiak, Quentin Orecchioni, Marie-Pierre Gigandet
article en
1 citations

Abstract

• Silver-tungsten coatings were successfully electrodeposited from DMH electrolyte • Tungsten contents close to optimal for functional properties without thiourea. • The induced codeposition mechanism is coherent with an intermediate bimetallic complex • Silver ion reduction is under mass transport control and tungsten under kinetic • No silver-tungsten reduction was possible with less than two protonated carboxyl groups Silver-tungsten coatings were successfully electrodeposited on platinum and copper substrates from a non-toxic 5.5-dimethylhydantoin electrolyte at low pH and two different carboxylic acid forms: citrate or tartrate. Tungsten contents remain at low levels compared to former works, but close to the values considered as optimal for functional properties without having to recourse to controversial substances such as thiourea. Electrochemical studies by linear sweep voltammetry allow to distinguish two typical behaviors and give interesting insight into the induced codeposition mechanism. Silver-tungsten codeposition only occurred at pH 2.0 and 3.5 using citrates and at pH 2.0 using tartrates, corresponding to the forms H 3 Cit, H 2 Cit -2 , and H 2 Tar, respectively. No silver-tungsten reduction was possible with less than two protonated carboxyl groups on either tartrate or citrate ions. Separate silver and tungsten lattice are both present in the resulting alloy. Grain and crystallite sizes were observed by SEM. XPS investigations show that for our low W content alloys, silver is found to be metallic whereas tungsten is present in oxide form. The carbon peaks and also gaps between peaks when N is absent indicate that citrates are present in the coating, unlike DMH.

Electrochimica ActaVol. 509
Centre National de la Recherche Scientifique (FR), Université de Bourgogne (FR), IRT M2P (FR), Institut UTINAM (FR), Laboratoire Interdisciplinaire Carnot de Bourgogne (FR), Université de Franche-Comté (FR)
Clean water and sanitation
Openalex Percentile: Top 46%
Semiconductor materials and devices
0.21
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