Effect of Film Thickness on the Structural, Morphological, Optical, and Electrical Properties of TiO<sub>2</sub> Films Prepared using Sol-Gel Process
In this work, we have fabricated four different thicknesses of TiO<inf xmlns:mml="http://www.w3.org/1998/Math/MathML" xmlns:xlink="http://www.w3.org/1999/xlink">2</inf> films using a simple, flexible, and cost-efficient sol-gel technique. The influence of thickness variation on the material properties is systematically studied using X-ray diffraction (XRD), Laser Raman Spectroscopy (LRS), Scanning Electron Microscopy (SEM), and UV-visible spectroscopy. Additionally, current-voltage (I-V) measurements are conducted by depositing Titanium/Gold (Ti/Au) contacts on top of the films to determine the dark current of the TiO<inf xmlns:mml="http://www.w3.org/1998/Math/MathML" xmlns:xlink="http://www.w3.org/1999/xlink">2</inf> films. The results obtained from this work provide a valuable understanding of the correlation between film thickness and the changes it introduces to its material and electrical properties. The study will help in optimizing the properties of the films for their further utility in a wide range of applications in research and development.
Authors
- P. Sarin (ORCID: https://orcid.org/0000-0003-4381-5261)
- Elizabeth George (ORCID: https://orcid.org/0000-0003-2020-7810)
- Pankaj Chetry (ORCID: https://orcid.org/0000-0002-2579-2564)
- Rupa Jeena
- Mohammed Aslam (ORCID: https://orcid.org/0000-0003-2782-0167)
- J. Sarkar (ORCID: https://orcid.org/0009-0008-1304-4332)
Institutions
- Indian Institute of Technology Bombay (IN)
- Queen Mary University of London (GB)
- IITB-Monash Research Academy (IN)
Publication Details
- Published
- 2024-09-08
- DOI
- https://doi.org/10.1109/nap62956.2024.10739745
- Primary Topic
- Chalcogenide Semiconductor Thin Films
- Type
- article
- Field-Weighted Citation Impact
- 0.00