Annealing Effect on Structural and Mechanical Properties of Atomic Layer Deposited Cr<sub>2</sub>O<sub>3</sub> Films Doped with Ti and Al
The current study demonstrates the impact of Al and Ti doping of Cr<inf xmlns:mml="http://www.w3.org/1998/Math/MathML" xmlns:xlink="http://www.w3.org/1999/xlink">2</inf>O<inf xmlns:mml="http://www.w3.org/1998/Math/MathML" xmlns:xlink="http://www.w3.org/1999/xlink">3</inf> ultra-thin films ($\leq \mathbf{5 0 ~ n m}$) on thermal stability and oxidation barrier characteristics that are important features for various applications. The findings highlight that Al-doped Cr<inf xmlns:mml="http://www.w3.org/1998/Math/MathML" xmlns:xlink="http://www.w3.org/1999/xlink">2</inf>O<inf xmlns:mml="http://www.w3.org/1998/Math/MathML" xmlns:xlink="http://www.w3.org/1999/xlink">3</inf> films, synthesized by atomic layer deposition method, possess good thermal stability, oxygen diffusion barrier characteristics at high temperatures and mechanical hardness of $\sim 18.4 \mathrm{GPa}$, making them promising protective coatings for high-temperature applications in aerospace and automotive sectors, and nano- or micro-electrochemical systems.
Authors
- Taivo Jõgiaas (ORCID: https://orcid.org/0000-0001-5024-6867)
- Mahtab Salari Mehr (ORCID: https://orcid.org/0000-0002-9338-006X)
- Hugo Mändar (ORCID: https://orcid.org/0000-0001-5306-5375)
- Lauri Aarik (ORCID: https://orcid.org/0000-0002-7785-1351)
Institutions
- University of Tartu (EE)
Publication Details
- Published
- 2024-09-08
- DOI
- https://doi.org/10.1109/nap62956.2024.10739705
- Primary Topic
- Pigment Synthesis and Properties
- Type
- article
- Field-Weighted Citation Impact
- 0.00