Chromatic aberration in homogeneous diameter expansion growth of AlN crystals by the PVT method

Abstract Homogeneous diameter expansion growth is the preferred method for preparing large-sized AlN single crystals using the PVT method. However, chromatic aberration between the expansion and seed regions, as well as localized chromatic aberrations within the expansion region, are commonly observed, but not deeply investigated yet. This paper investigates the homoepitaxial lateral growth of AlN crystals using Al-polar face seeds and analyzes the crystal structure, composition, and optical properties of both the expansion and seed regions. XRD and Raman spectroscopy indicate no significant differences in crystallization quality between the expansion and seed regions. XPS and photoluminescence characterizations reveal that the light yellow color of the seed region is mainly due to $$V_{Al}$$ <mml:math xmlns:mml="http://www.w3.org/1998/Math/MathML"> <mml:msub> <mml:mi>V</mml:mi> <mml:mrow> <mml:mi>Al</mml:mi> </mml:mrow> </mml:msub> </mml:math> defects. In contrast, the deeper yellow color in the expansion region is caused by $$V_{Al}$$ <mml:math xmlns:mml="http://www.w3.org/1998/Math/MathML"> <mml:msub> <mml:mi>V</mml:mi> <mml:mrow> <mml:mi>Al</mml:mi> </mml:mrow> </mml:msub> </mml:math> – $$O_N$$ <mml:math xmlns:mml="http://www.w3.org/1998/Math/MathML"> <mml:msub> <mml:mi>O</mml:mi> <mml:mi>N</mml:mi> </mml:msub> </mml:math> complex defects. Additionally, etching results exhibit a polarity reversal from the Al-polar to N-polar growth face in localized chromatic aberration region. The bonding angle of approximately $${90}^\circ$$ <mml:math xmlns:mml="http://www.w3.org/1998/Math/MathML"> <mml:msup> <mml:mrow> <mml:mn>90</mml:mn> </mml:mrow> <mml:mo>∘</mml:mo> </mml:msup> </mml:math> at the $$B_{1}$$ <mml:math xmlns:mml="http://www.w3.org/1998/Math/MathML"> <mml:msub> <mml:mi>B</mml:mi> <mml:mn>1</mml:mn> </mml:msub> </mml:math> bond (formation by the half-filled orbitals of the Al and N atoms) site, which occurs during the bonding of Al and N atoms, results in the polarity reversal during m-plane lateral growth. This work provides implications for the preparation of large-sized AlN single crystals.

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Publication Details

Journal
The European Physical Journal Special Topics
Published
2024-11-06
DOI
https://doi.org/10.1140/epjs/s11734-024-01388-9
Citations
4
Primary Topic
GaN-based semiconductor devices and materials
Type
article
Field-Weighted Citation Impact
1.24

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article

Chromatic aberration in homogeneous diameter expansion growth of AlN crystals by the PVT method

Jianhua Ji, Jun Tan, Baikui Li, Liying Yin et al.
4 citations
The European Physical Journal Special Topics
GaN-based semiconductor devices and materials
1.24
article

Chromatic aberration in homogeneous diameter expansion growth of AlN crystals by the PVT method

Jianhua Ji, Jun Tan, Baikui Li, Liying Yin, Honglei Wu, Zhenhua Sun, Wenliang Li, Guang S. He, Zuoyan Qin
article en
4 citations

Abstract

Abstract Homogeneous diameter expansion growth is the preferred method for preparing large-sized AlN single crystals using the PVT method. However, chromatic aberration between the expansion and seed regions, as well as localized chromatic aberrations within the expansion region, are commonly observed, but not deeply investigated yet. This paper investigates the homoepitaxial lateral growth of AlN crystals using Al-polar face seeds and analyzes the crystal structure, composition, and optical properties of both the expansion and seed regions. XRD and Raman spectroscopy indicate no significant differences in crystallization quality between the expansion and seed regions. XPS and photoluminescence characterizations reveal that the light yellow color of the seed region is mainly due to $$V_{Al}$$ <mml:math xmlns:mml="http://www.w3.org/1998/Math/MathML"> <mml:msub> <mml:mi>V</mml:mi> <mml:mrow> <mml:mi>Al</mml:mi> </mml:mrow> </mml:msub> </mml:math> defects. In contrast, the deeper yellow color in the expansion region is caused by $$V_{Al}$$ <mml:math xmlns:mml="http://www.w3.org/1998/Math/MathML"> <mml:msub> <mml:mi>V</mml:mi> <mml:mrow> <mml:mi>Al</mml:mi> </mml:mrow> </mml:msub> </mml:math> – $$O_N$$ <mml:math xmlns:mml="http://www.w3.org/1998/Math/MathML"> <mml:msub> <mml:mi>O</mml:mi> <mml:mi>N</mml:mi> </mml:msub> </mml:math> complex defects. Additionally, etching results exhibit a polarity reversal from the Al-polar to N-polar growth face in localized chromatic aberration region. The bonding angle of approximately $${90}^\circ$$ <mml:math xmlns:mml="http://www.w3.org/1998/Math/MathML"> <mml:msup> <mml:mrow> <mml:mn>90</mml:mn> </mml:mrow> <mml:mo>∘</mml:mo> </mml:msup> </mml:math> at the $$B_{1}$$ <mml:math xmlns:mml="http://www.w3.org/1998/Math/MathML"> <mml:msub> <mml:mi>B</mml:mi> <mml:mn>1</mml:mn> </mml:msub> </mml:math> bond (formation by the half-filled orbitals of the Al and N atoms) site, which occurs during the bonding of Al and N atoms, results in the polarity reversal during m-plane lateral growth. This work provides implications for the preparation of large-sized AlN single crystals.

The European Physical Journal Special TopicsVol. 234(2)
Shenzhen University (CN), China Electronics Technology Group Corporation (CN)
National Natural Science Foundation of China, Guangdong Science and Technology Department, Science, Technology and Innovation Commission of Shenzhen Municipality, Key Technologies Research and Development Program
Openalex Percentile: Top 21%
GaN-based semiconductor devices and materials
1.24
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