Research on Nanometer Precision Measurement Method of High Order Even Aspheres

Optical aspheres are demanded with extremely high precision to meet functional requirements in space telescopes, extreme ultraviolet lithography, and other modern large optical systems. The nano-precision fabrication of optical aspheres requires high-precision measurements to guide deterministic optical processing. Null test is the preferred method for high-precision measurements. Null optics are required to compensate for the incident wavefront in the null test of optical aspheres. However, wavefront aberrations caused by the transmission flat or transmission sphere of interferometer and null optics can limit measurement accuracy and need to be separated. A nano-precision measurement method is proposed for the even optical aspheres of high order in this paper. A computer-generated hologram is used as a null optic to realize a null test on optical aspheres. Mapping distortion correction is performed on the measurement results to ensure that the transverse coordinates of the measurement results correspond correctly to those of the test surface. Absolute testing is applied to separate the wavefront aberrations caused by the computer-generated hologram and interferometer optics. Finally, the results obtained by this method were used to guide deterministic optical processing, enabling the nano-precision fabrication of optical aspheres.