Electron temperature characterization of H<sub>2</sub> processing plasma by optical emission spectroscopy
Abstract Optical emission spectroscopy of hydrogen (H 2 ) plasma is performed to characterize the electron temperature, T e . The H 2 Fulcher band emission and radiative dissociation continuum are measured, where the Fulcher band emission is recognized to be T e -sensitive, compared with the dissociation continuum. With this T e -sensitive nature, a simple way of determining T e is proposed, specifically using the intensity ratio of the Fulcher band emission to dissociation continuum. The T e determination is demonstrated for H 2 processing plasmas generated by capacitively coupled discharges at different gas pressures.
Authors
- Shota Nunomura (ORCID: https://orcid.org/0000-0002-6746-2619)
- Naomichi Ezumi (ORCID: https://orcid.org/0000-0002-3701-7741)
Institutions
- University of Tsukuba (JP)
- National Institute of Advanced Industrial Science and Technology (JP)
Publication Details
- Journal
- Applied Physics Express
- Published
- 2024-11-01
- DOI
- https://doi.org/10.35848/1882-0786/ad87aa
- Citations
- 3
- Primary Topic
- Plasma Diagnostics and Applications
- Type
- article
- Field-Weighted Citation Impact
- 0.63
Funders
- Japan Society for the Promotion of Science