A SIMPLE SOURCE OF METAL AND GAS IONS FOR ION BEAM TECHNOLOGICAL INSTALLATIONS

At the stand of the Institute of Applied Physics of the National Academy of Sciences of Ukraine, a small-sized spattering source of metal and gas ions was developed, manufactured and tested. Ionization of sputtered atoms occurs by fast oscillating electrons in a longitudinal magnetic field. A beam containing ions of plasma-forming gas and metal is output through an emission hole in the anticathode. The source has high ion current stability, is easy to maintain, and can generate ions from any conductive solid. Modeling and manufacturing of an ion-optical system for this source, which is part of the injector of the implanter of the Institute of Applied Physics of the National Academy of Sciences of Ukraine, was carried out.