Four-level diffractive photon sieves by deep-UV femtosecond laser ablation

A growing demand for complex light manipulation and miniaturization of optics necessitates advanced optical elements, operating on light diffraction phenomena, capable not only of reshaping the intensity distribution but also integrating many optical functions in a compact, durable device. The prevailing fabrication methods for these elements often involve multi-step lithographic processes. In contrast, direct laser ablation offers a single-step, cost-effective, and maskless alternative. However, using solid-state laser systems’ fundamental wavelength (in the IR range) for ablation lacks the precise depth control required for multi-level diffractive optical element fabrication. In this paper, we present the first experimental proof that femtosecond direct laser ablation in the UV spectral range is a reliable method for fabricating diffractive optical elements. We demonstrate the high-quality production of compact photon sieve focusing elements with the shortest focal length ever reported at 9 mm. Furthermore, we report an efficiency of 3.3%, which, to our knowledge, is the highest for elements with such a small focal length and not far from the theoretical efficiency limit of 4.46% (considering perfect cylindrical ablated pits). Moreover, our fabricated elements focus light to a 2.3% smaller focal spot if compared to the refractive lens with the same parameters. This fabrication method shows great promise for advanced applications that require precise depth control in wide band gap materials, such as the fused quartz used in this study.