Analysis of Fabrication Techniques for Thin Film Schottky Diode for 5G and Beyond
Thin film technology is made of material ranging from nanometers to micrometer in thickness. Thin film technology was developed to cater the needs of the IC industry. High demand for thin films compatible with high speed devices has introduced us to updated fabrication technologies. Knowledge of properties of thin nano-films and electronic devices such as diodes, transistors, capacitors can be shall be used for future communication technologies and devices. A review of different fabrication techniques is discussed in this paper with their superiorities and limitations.
Authors
- Shilpa Srivastava
- Manisha Rajoriya (ORCID: https://orcid.org/0000-0002-3960-3488)
- Mohit Sahni (ORCID: https://orcid.org/0000-0002-3461-3687)
- Usha Tiwari
Institutions
- Sharda University (IN)
Publication Details
- Published
- 2024-08-29
- DOI
- https://doi.org/10.1109/iceect61758.2024.10739111
- Primary Topic
- Semiconductor materials and interfaces
- Type
- article
- Field-Weighted Citation Impact
- 0.00