Analysis of Fabrication Techniques for Thin Film Schottky Diode for 5G and Beyond

Thin film technology is made of material ranging from nanometers to micrometer in thickness. Thin film technology was developed to cater the needs of the IC industry. High demand for thin films compatible with high speed devices has introduced us to updated fabrication technologies. Knowledge of properties of thin nano-films and electronic devices such as diodes, transistors, capacitors can be shall be used for future communication technologies and devices. A review of different fabrication techniques is discussed in this paper with their superiorities and limitations.

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Publication Details

Published
2024-08-29
DOI
https://doi.org/10.1109/iceect61758.2024.10739111
Primary Topic
Semiconductor materials and interfaces
Type
article
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Analysis of Fabrication Techniques for Thin Film Schottky Diode for 5G and Beyond

Shilpa Srivastava, Manisha Rajoriya, Mohit Sahni, Usha Tiwari
Semiconductor materials and interfaces
article

Analysis of Fabrication Techniques for Thin Film Schottky Diode for 5G and Beyond

Shilpa Srivastava, Manisha Rajoriya, Mohit Sahni, Usha Tiwari
article en

Abstract

Thin film technology is made of material ranging from nanometers to micrometer in thickness. Thin film technology was developed to cater the needs of the IC industry. High demand for thin films compatible with high speed devices has introduced us to updated fabrication technologies. Knowledge of properties of thin nano-films and electronic devices such as diodes, transistors, capacitors can be shall be used for future communication technologies and devices. A review of different fabrication techniques is discussed in this paper with their superiorities and limitations.

Sharda University (IN)
Affordable and clean energy
Openalex Percentile: Top 82%
Semiconductor materials and interfaces
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