Demonstration of 1.2-kV Rated Novel Power Poly-Si/4H-SiC Heterojunction Diode With Record Low Forward Voltage Drop

The forward voltage drop (<inline-formula xmlns:mml="http://www.w3.org/1998/Math/MathML" xmlns:xlink="http://www.w3.org/1999/xlink"> <tex-math notation="LaTeX">${V}_{\text {F}}$ </tex-math></inline-formula>) is one of the most critical parameters of power diodes, determining the power consumption and specific area performance. In this article, a novel 1.2-kV rated 4H-silicon carbide (SiC) power heterojunction diode (HJD) with the n-type ion-implanted polycrystalline silicon (Poly-Si) anode is proposed and experimentally demonstrated for the first time, featuring a record low <inline-formula xmlns:mml="http://www.w3.org/1998/Math/MathML" xmlns:xlink="http://www.w3.org/1999/xlink"> <tex-math notation="LaTeX">${V}_{\text {F}}$ </tex-math></inline-formula> of 1.080 V at the 2.5-A/mm2 forward current density (<inline-formula xmlns:mml="http://www.w3.org/1998/Math/MathML" xmlns:xlink="http://www.w3.org/1999/xlink"> <tex-math notation="LaTeX">${J}_{\text {F}}$ </tex-math></inline-formula>), which is 25% lower than reported conventional 4H-SiC power diodes with the Ti metal anode. The heterojunction barrier height is extracted to an ultralow 0.804 eV, accounting for the remarkable <inline-formula xmlns:mml="http://www.w3.org/1998/Math/MathML" xmlns:xlink="http://www.w3.org/1999/xlink"> <tex-math notation="LaTeX">${V}_{\text {F}}$ </tex-math></inline-formula> decrease. The introduction and optimization of the p-type shielding region enables the avalanche breakdown voltage above 1500 V. The increase in the reverse current density (<inline-formula xmlns:mml="http://www.w3.org/1998/Math/MathML" xmlns:xlink="http://www.w3.org/1999/xlink"> <tex-math notation="LaTeX">${J}_{\text {R}}$ </tex-math></inline-formula>) with lowering barrier height is also suppressed even at high temperature (T). <inline-formula xmlns:mml="http://www.w3.org/1998/Math/MathML" xmlns:xlink="http://www.w3.org/1999/xlink"> <tex-math notation="LaTeX">${J}_{\text {R}}$ </tex-math></inline-formula> at the 800-V cathode voltage is decreased to be 1.47 and <inline-formula xmlns:mml="http://www.w3.org/1998/Math/MathML" xmlns:xlink="http://www.w3.org/1999/xlink"> <tex-math notation="LaTeX">$231~\mu $ </tex-math></inline-formula>A/mm2 at <inline-formula xmlns:mml="http://www.w3.org/1998/Math/MathML" xmlns:xlink="http://www.w3.org/1999/xlink"> <tex-math notation="LaTeX">${T} =298$ </tex-math></inline-formula> and 423 K, respectively. The almost zero reverse recovery and perfect dynamic performance are demonstrated by the double-pulsed switching test platform. The experimental investigations as well as the developed fully compatible fabrication process show the great potential of the proposed HJD as the next-generation low-loss device.

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Publication Details

Journal
IEEE Transactions on Electron Devices
Published
2024-11-04
DOI
https://doi.org/10.1109/ted.2024.3482250
Citations
3
Primary Topic
Silicon Carbide Semiconductor Technologies
Type
article
Field-Weighted Citation Impact
0.63

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article

Demonstration of 1.2-kV Rated Novel Power Poly-Si/4H-SiC Heterojunction Diode With Record Low Forward Voltage Drop

Zilong Wu, Zhaoxiang Wei, Jiaxing Wei, Hao Fu et al.
3 citations
IEEE Transactions on Electron Devices
Silicon Carbide Semiconductor Technologies
0.63
article

Demonstration of 1.2-kV Rated Novel Power Poly-Si/4H-SiC Heterojunction Diode With Record Low Forward Voltage Drop

Zilong Wu, Zhaoxiang Wei, Jiaxing Wei, Hao Fu, Jiameng Sun, Shaohong Li, Siyang Liu, Weifeng Sun, Song Bai, Xiaolei Yang, Xiangrui Fan, Guozhen Zheng, Runhua Huang, Xinyu Zhang
article en
3 citations

Abstract

The forward voltage drop (<inline-formula xmlns:mml="http://www.w3.org/1998/Math/MathML" xmlns:xlink="http://www.w3.org/1999/xlink"> <tex-math notation="LaTeX">${V}_{\text {F}}$ </tex-math></inline-formula>) is one of the most critical parameters of power diodes, determining the power consumption and specific area performance. In this article, a novel 1.2-kV rated 4H-silicon carbide (SiC) power heterojunction diode (HJD) with the n-type ion-implanted polycrystalline silicon (Poly-Si) anode is proposed and experimentally demonstrated for the first time, featuring a record low <inline-formula xmlns:mml="http://www.w3.org/1998/Math/MathML" xmlns:xlink="http://www.w3.org/1999/xlink"> <tex-math notation="LaTeX">${V}_{\text {F}}$ </tex-math></inline-formula> of 1.080 V at the 2.5-A/mm2 forward current density (<inline-formula xmlns:mml="http://www.w3.org/1998/Math/MathML" xmlns:xlink="http://www.w3.org/1999/xlink"> <tex-math notation="LaTeX">${J}_{\text {F}}$ </tex-math></inline-formula>), which is 25% lower than reported conventional 4H-SiC power diodes with the Ti metal anode. The heterojunction barrier height is extracted to an ultralow 0.804 eV, accounting for the remarkable <inline-formula xmlns:mml="http://www.w3.org/1998/Math/MathML" xmlns:xlink="http://www.w3.org/1999/xlink"> <tex-math notation="LaTeX">${V}_{\text {F}}$ </tex-math></inline-formula> decrease. The introduction and optimization of the p-type shielding region enables the avalanche breakdown voltage above 1500 V. The increase in the reverse current density (<inline-formula xmlns:mml="http://www.w3.org/1998/Math/MathML" xmlns:xlink="http://www.w3.org/1999/xlink"> <tex-math notation="LaTeX">${J}_{\text {R}}$ </tex-math></inline-formula>) with lowering barrier height is also suppressed even at high temperature (T). <inline-formula xmlns:mml="http://www.w3.org/1998/Math/MathML" xmlns:xlink="http://www.w3.org/1999/xlink"> <tex-math notation="LaTeX">${J}_{\text {R}}$ </tex-math></inline-formula> at the 800-V cathode voltage is decreased to be 1.47 and <inline-formula xmlns:mml="http://www.w3.org/1998/Math/MathML" xmlns:xlink="http://www.w3.org/1999/xlink"> <tex-math notation="LaTeX">$231~\mu $ </tex-math></inline-formula>A/mm2 at <inline-formula xmlns:mml="http://www.w3.org/1998/Math/MathML" xmlns:xlink="http://www.w3.org/1999/xlink"> <tex-math notation="LaTeX">${T} =298$ </tex-math></inline-formula> and 423 K, respectively. The almost zero reverse recovery and perfect dynamic performance are demonstrated by the double-pulsed switching test platform. The experimental investigations as well as the developed fully compatible fabrication process show the great potential of the proposed HJD as the next-generation low-loss device.

IEEE Transactions on Electron DevicesVol. 71(12)
Southeast University (CN)
National Natural Science Foundation of China, Natural Science Foundation of Jiangsu Province, Fundamental Research Funds for the Central Universities
Affordable and clean energy
Openalex Percentile: Top 31%
Silicon Carbide Semiconductor Technologies
0.63
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