The effects of low boron incorporation on the structural and optical properties of B<sub> <i>x</i> </sub>Ga<sub>1−<i>x</i> </sub>N/SiC epitaxial layers
BGaN epilayers with boron contents up to 5.6% were grown on SiC substrates by metal–organic chemical vapor deposition. The effects of boron incorporation on the structural and optical properties were studied by high-resolution X-ray diffraction (XRD), atomic force microscopy (AFM), Raman spectroscopy and photoluminescence (PL) spectroscopy. XRD reciprocal-space maps around the symmetric 0002 and asymmetric 11 {\overline 2} 4 reflections allowed evaluation of the lattice constants and lattice mismatch with respect to the underlying substrate. XRD rocking curves and AFM measurements indicated the mosaic microstructure of the epilayer. The impact of boron content on crystallite size, tilt and twist is evaluated and the correlation with threading dislocation density is discussed. The deterioration of optical properties with increasing boron content was assessed by Raman and PL spectroscopy.
Authors
- J. Mickevičius (ORCID: https://orcid.org/0000-0003-1623-4138)
- Florin Comănescu
- Cosmin Romanițan (ORCID: https://orcid.org/0000-0002-5615-6624)
- E.-M. Pavelescu (ORCID: https://orcid.org/0000-0001-9698-6748)
- Marius Stoian (ORCID: https://orcid.org/0000-0002-6637-6671)
- Raluca Gavrilă (ORCID: https://orcid.org/0000-0002-0156-6036)
- T. Malinauskas (ORCID: https://orcid.org/0000-0001-5722-664X)
- A. Kadys (ORCID: https://orcid.org/0009-0000-4236-1531)
- Pericle Vărășteanu
Institutions
- Vilnius University (LT)
- National Institute for Research and Development in Microtechnologies (RO)
- Hyperion University (RO)
Publication Details
- Journal
- Journal of Applied Crystallography
- Published
- 2024-11-04
- DOI
- https://doi.org/10.1107/s1600576724009579
- Citations
- 1
- Primary Topic
- Semiconductor materials and devices
- Type
- article
- Field-Weighted Citation Impact
- 0.21
Funders
- Ministerul Cercetării, Inovării şi Digitalizării