Optical Studies of Silver Oxide Deposited Thin Films Using the RF Sputtering Technique

Background/Objectives: Silver Oxide is an efficient material because it is used in batteries. Apart from this, it is a moderate oxidizing agent in a variety of processes including the oxidation of aldehydes to carboxylic acids. The objective of the study is to synthesize silver oxide films by RF sputtering technique so that synthesized films can be inserted in the spectrophotometer for optical study. Methods: Silver Oxide films were deposited on Fluorine-doped Tin Oxide (FTO) glass using Radio Frequency (RF) sputtering method and annealed at 200 °C, for two hours, and then it was used in DK2 Ratio recording Spectrophotometer to analyze absorption and transmission data. Findings: The thickness of the films was measured using a non-contact optical Profilometer, in the range of (42– 660) nm. The films were subsequently exposed to optical characterization, revealing exceptionally low transmittance and high absorbance. The band gap is estimated to be 2.2 eV. The X-ray diffraction (XRD) studies reveal that the material is crystalline and Miller indices have also been determined. The morphology and topography of the thin films were analyzed using Field Emission Scanning Electron Microscope (FESEM) and the chemical composition was estimated using EDS. Novelty: The present work reveals that the optical properties are highly dependent on the thickness and the material distribution. The direct band gap energy is evaluated from the absorption spectrum which comes out to be 2.2 eV. The XRD spectra synthesized Silver Oxide films are crystalline in nature. Keywords: Silver Oxide, Band gap, XRD, FESEM