Short Term Drift in the Recovery Time of GaN HEMT Switches

A step stress characterization method is proposed to enable the study of the gradual degradation of memory effect-induced recovery in GaN HEMT switches. This is achieved by characterizing the transition from off- to on-state over time and tracking short-term degradation in the recovery of the insertion loss for decreasing off-state voltages. The method is demonstrated on three different technologies. The results show that the degradation varies between foundry processes, illustrating the merit of the method for evaluating the impact of memory effects in GaN HEMT switch operation.

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Publication Details

Published
2024-09-23
DOI
https://doi.org/10.23919/eumic61603.2024.10732079
Citations
2
Primary Topic
Advancements in Semiconductor Devices and Circuit Design
Type
article
Field-Weighted Citation Impact
0.42
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article

Short Term Drift in the Recovery Time of GaN HEMT Switches

Andreas Divinyi, Mattias Thorsell, Niklas Rorsman, Niklas Billström
2 citations
Advancements in Semiconductor Devices and Circuit Design
0.42
article

Short Term Drift in the Recovery Time of GaN HEMT Switches

Andreas Divinyi, Mattias Thorsell, Niklas Rorsman, Niklas Billström
article en
2 citations

Abstract

A step stress characterization method is proposed to enable the study of the gradual degradation of memory effect-induced recovery in GaN HEMT switches. This is achieved by characterizing the transition from off- to on-state over time and tracking short-term degradation in the recovery of the insertion loss for decreasing off-state voltages. The method is demonstrated on three different technologies. The results show that the degradation varies between foundry processes, illustrating the merit of the method for evaluating the impact of memory effects in GaN HEMT switch operation.

Chalmers University of Technology (SE)
Openalex Percentile: Top 37%
Advancements in Semiconductor Devices and Circuit Design
0.42
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