Investigation of Thermal Resistance Extraction of GaN HEMTs through DCT Measurements Techniques and TCAD-Based Physical Simulations
In this paper, we extract the thermal resistance (R<inf xmlns:mml="http://www.w3.org/1998/Math/MathML" xmlns:xlink="http://www.w3.org/1999/xlink">TH</inf>) of an AlGaN/GaN HEMT using a simple approach based on Drain Current Transient (DCT) spectroscopy technique. Previous work confirms that acceptor-like traps present in the Fe-doped GaN buffer are responsible for the drain-lag effect observed in the measurement. The main goal of this work is the use of trap emission time constant which is very sensitive to temperature. The extracted R<inf xmlns:mml="http://www.w3.org/1998/Math/MathML" xmlns:xlink="http://www.w3.org/1999/xlink">TH</inf> using the new approach was around 13 °C.mm/W. TCAD confirms that the R<inf xmlns:mml="http://www.w3.org/1998/Math/MathML" xmlns:xlink="http://www.w3.org/1999/xlink">TH</inf> determined using the new measurement approach represents the R<inf xmlns:mml="http://www.w3.org/1998/Math/MathML" xmlns:xlink="http://www.w3.org/1999/xlink">TH</inf> located around 150 nm under the gate.
Authors
- F. Gaillard
- Raphaël Sommet (ORCID: https://orcid.org/0000-0002-4170-1781)
- Gilles Gauthier (ORCID: https://orcid.org/0000-0002-2624-3508)
- Mohamed Bouslama (ORCID: https://orcid.org/0000-0001-8297-1772)
- S. Piotrowicz
- Jean‐Christophe Nallatamby (ORCID: https://orcid.org/0000-0002-5082-3932)
- J. Jacquet (ORCID: https://orcid.org/0000-0003-4629-7578)
Institutions
- XLIM (FR)
- III V Lab (FR)
Publication Details
- Published
- 2024-09-23
- DOI
- https://doi.org/10.23919/eumic61603.2024.10732560
- Citations
- 3
- Primary Topic
- GaN-based semiconductor devices and materials
- Type
- article
- Field-Weighted Citation Impact
- 0.93