Controlled Formation of TiO ₂ Thin Films by Reactive Magnetron Sputtering

Titanium dioxide thin films have been successfully coated on glass substrates using reactive magnetron sputtering and we highlight how different deposition parameters influence the crystalline structure and optical properties of the deposited layers. After the deposition process, amorphous films were obtained and after thermal treatments, the crystalline structure transformed to anatase and rutile forms, depending on the deposition parameters. The grown thin films were characterized by X-ray diffraction, atomic force microscopy, ellipsometry and UV-visible spectroscopy). In order to confirm the results obtained regarding the ellipsometric measurements, the OPTIFIT software was used to determine the variation of the refractive indices from the transmission spectrum measured by spectroscopy.