Analysis of patent innovation evolution and layout characteristics of global new textile materials technologies

Abstract Vigorously developing new textile material technology is critical to improving the textile industry's high-tech level, upgrading its transformation, promoting high-quality development of the real economy, and enhancing the country's overall power. This paper analyzes patent technology to explore new textile material technology layout characteristics and evolution trends for the strategic basis of industrial transformation and development on a global scale. The research took new textile material technology patents as the research object, constructed 76,373 invention application patent data pools in China, Europe, Japan, South Korea, and the United States, and analysed new textile material technology structural characteristics and their evolution trend from three aspects of patent structure, layout characteristics and evolutions. As a result, it was found that the development plans and target focuses of textile new material technology vary from country to country. Global enterprises in garments, advanced material production, and chemical materials, represented by DuPont, 3M, and Dow Global Technologies, provide an important guarantee for the United States in maintaining its global leadership position in the development of the new textile material industry. Japan pays more attention to the practicality of new materials and considers the coordinated development of the environment and resources. Europe and South Korea focus on the construction of industrial clusters with their own characteristics, establish and improve the industrial standardization system based on core technology and core manufacturing, and maintain global competitiveness in textile new material technology. After 2009, the number of patent applications for new textile material technology in China exceeded that of Europe, the United States, Japan, and South Korea, becoming a global patent power. However, there is still a huge gap between the quality of patents and the layout of new cutting-edge materials in China and those in developed countries such as the United States and Japan, which is the main problem that needs to be solved urgently in the future innovation and development of China's textile industry, technology planning and layout.