ZnO/Ga<sub>2</sub>O<sub>3</sub> Optoelectronic Device with Wide Response Wavelength

Heterojunction optoelectronic devices have always been a research hotspot. In this paper, ZnO/Ga<inf xmlns:mml="http://www.w3.org/1998/Math/MathML" xmlns:xlink="http://www.w3.org/1999/xlink">2</inf>O<inf xmlns:mml="http://www.w3.org/1998/Math/MathML" xmlns:xlink="http://www.w3.org/1999/xlink">3</inf> heterojunction thin films are used to form optoelectronic devices with Ni metal. A 100nm ZnO thin film is magnetron sputtered on a sapphire substrate, then, a 300nm Ga<inf xmlns:mml="http://www.w3.org/1998/Math/MathML" xmlns:xlink="http://www.w3.org/1999/xlink">2</inf>O<inf xmlns:mml="http://www.w3.org/1998/Math/MathML" xmlns:xlink="http://www.w3.org/1999/xlink">3</inf> material is deposited on the ZnO thin film by magnetron sputtering. The high-quality Ga<inf xmlns:mml="http://www.w3.org/1998/Math/MathML" xmlns:xlink="http://www.w3.org/1999/xlink">2</inf>O<inf xmlns:mml="http://www.w3.org/1998/Math/MathML" xmlns:xlink="http://www.w3.org/1999/xlink">3</inf> thin films were obtained by using ZnO as the substrate. After depositing Ni metal electrodes on Ga<inf xmlns:mml="http://www.w3.org/1998/Math/MathML" xmlns:xlink="http://www.w3.org/1999/xlink">2</inf>O<inf xmlns:mml="http://www.w3.org/1998/Math/MathML" xmlns:xlink="http://www.w3.org/1999/xlink">3</inf> thin films, ZnO/Ga<inf xmlns:mml="http://www.w3.org/1998/Math/MathML" xmlns:xlink="http://www.w3.org/1999/xlink">2</inf>O<inf xmlns:mml="http://www.w3.org/1998/Math/MathML" xmlns:xlink="http://www.w3.org/1999/xlink">3</inf> photodetection device is formed. The device has a photoresponse current of more than 10 times than the dark current under a bias of 5V. And this device has a photoresponse time of 1.1s and a relaxation time of 1s, respectively. Compared with ZnO thin film optoelectronic device, ZnO/Ga<inf xmlns:mml="http://www.w3.org/1998/Math/MathML" xmlns:xlink="http://www.w3.org/1999/xlink">2</inf>O<inf xmlns:mml="http://www.w3.org/1998/Math/MathML" xmlns:xlink="http://www.w3.org/1999/xlink">3</inf> device has a wider spectral response and higher photoresponsivity at the same wavelength. This work provides a theoretical and practical basis for the growth of oxide heterojunctions, and has reference significance for the later research of heterojunction thin film devices.

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Published
2024-08-29
DOI
https://doi.org/10.1109/neessc62857.2024.10733465
Primary Topic
Ga2O3 and related materials
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article

ZnO/Ga2O3 Optoelectronic Device with Wide Response Wavelength

Hantao Xu, Jiangtao Li, Dejie Yu, Tao Li
Ga2O3 and related materials
article

ZnO/Ga2O3 Optoelectronic Device with Wide Response Wavelength

Hantao Xu, Jiangtao Li, Dejie Yu, Tao Li
article en

Abstract

Heterojunction optoelectronic devices have always been a research hotspot. In this paper, ZnO/Ga<inf xmlns:mml="http://www.w3.org/1998/Math/MathML" xmlns:xlink="http://www.w3.org/1999/xlink">2</inf>O<inf xmlns:mml="http://www.w3.org/1998/Math/MathML" xmlns:xlink="http://www.w3.org/1999/xlink">3</inf> heterojunction thin films are used to form optoelectronic devices with Ni metal. A 100nm ZnO thin film is magnetron sputtered on a sapphire substrate, then, a 300nm Ga<inf xmlns:mml="http://www.w3.org/1998/Math/MathML" xmlns:xlink="http://www.w3.org/1999/xlink">2</inf>O<inf xmlns:mml="http://www.w3.org/1998/Math/MathML" xmlns:xlink="http://www.w3.org/1999/xlink">3</inf> material is deposited on the ZnO thin film by magnetron sputtering. The high-quality Ga<inf xmlns:mml="http://www.w3.org/1998/Math/MathML" xmlns:xlink="http://www.w3.org/1999/xlink">2</inf>O<inf xmlns:mml="http://www.w3.org/1998/Math/MathML" xmlns:xlink="http://www.w3.org/1999/xlink">3</inf> thin films were obtained by using ZnO as the substrate. After depositing Ni metal electrodes on Ga<inf xmlns:mml="http://www.w3.org/1998/Math/MathML" xmlns:xlink="http://www.w3.org/1999/xlink">2</inf>O<inf xmlns:mml="http://www.w3.org/1998/Math/MathML" xmlns:xlink="http://www.w3.org/1999/xlink">3</inf> thin films, ZnO/Ga<inf xmlns:mml="http://www.w3.org/1998/Math/MathML" xmlns:xlink="http://www.w3.org/1999/xlink">2</inf>O<inf xmlns:mml="http://www.w3.org/1998/Math/MathML" xmlns:xlink="http://www.w3.org/1999/xlink">3</inf> photodetection device is formed. The device has a photoresponse current of more than 10 times than the dark current under a bias of 5V. And this device has a photoresponse time of 1.1s and a relaxation time of 1s, respectively. Compared with ZnO thin film optoelectronic device, ZnO/Ga<inf xmlns:mml="http://www.w3.org/1998/Math/MathML" xmlns:xlink="http://www.w3.org/1999/xlink">2</inf>O<inf xmlns:mml="http://www.w3.org/1998/Math/MathML" xmlns:xlink="http://www.w3.org/1999/xlink">3</inf> device has a wider spectral response and higher photoresponsivity at the same wavelength. This work provides a theoretical and practical basis for the growth of oxide heterojunctions, and has reference significance for the later research of heterojunction thin film devices.

Shaoyang University (CN), Education Department of Hunan Province (CN)
Affordable and clean energy
Openalex Percentile: Top 89%
Ga2O3 and related materials
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