E-beam Lithography Technology for Quantum Device Fabrication and Nanoscale Patterning

Currently nanotechnology becoming more important with the implementation of nano devices including quantum devices. In this paper, we will briefly introduce the JEOL JBX-8100FS e-beam lithography tool which was recently installed in Hallym University and the current status of the exposure conditions set up. As applications using e-beam lithography tool, we will introduce Schottky barrier single hole transistor and silicon nanowire thermoelectric device, respectively. We are under researching plasmonic and quantum devices as basic research.