The fabrication of freestanding complex oxide membranes: Can we avoid using water?
Seeking a water-free epitaxial lift-off process: (1) Growth: An epitaxial film is grown on a sacrificial layer placed on a single-crystal substrate (top left). (2) Release: The film is released from the substrate without using a water-based sacrificial layer (top right). (3) Transfer: The film is transferred onto a new platform (bottom right). (4) Support Removal: A polymer support is removed from the film (bottom left).
Authors
- Daesung Park (ORCID: https://orcid.org/0000-0001-9212-7516)
- Nini Pryds (ORCID: https://orcid.org/0000-0002-5718-7924)
Institutions
- Technical University of Denmark (DK)
Publication Details
- Journal
- Journal of materials research/Pratt's guide to venture capital sources
- Published
- 2024-10-24
- DOI
- https://doi.org/10.1557/s43578-024-01461-y
- Citations
- 10
- Primary Topic
- Semiconductor materials and devices
- Type
- article
- Field-Weighted Citation Impact
- 2.09
Funders
- Villum Fonden
- Danmarks Tekniske Universitet
- European Research Council