Dynamic Extension Behavior of the Depletion Region in GaN HEMTs Monitored With a Channel-Probe Branch Structure

This letter proposes a method to monitor the dynamic extension process of the depletion region in GaN HEMTs. Based on a channel-probe branch structure, the transient channel potential (<inline-formula xmlns:mml="http://www.w3.org/1998/Math/MathML" xmlns:xlink="http://www.w3.org/1999/xlink"> <tex-math notation="LaTeX">$\text {V}_{\text {CP}}$ </tex-math></inline-formula>) at a certain distance from the gate was measured under off-state conditions. From the transient <inline-formula xmlns:mml="http://www.w3.org/1998/Math/MathML" xmlns:xlink="http://www.w3.org/1999/xlink"> <tex-math notation="LaTeX">$\text {V}_{\text {CP}}$ </tex-math></inline-formula> curves, the extension time of the depletion region was directly obtained for the first time, and it was found to exhibit an exponential dependence on the drain-gate bias (<inline-formula xmlns:mml="http://www.w3.org/1998/Math/MathML" xmlns:xlink="http://www.w3.org/1999/xlink"> <tex-math notation="LaTeX">$\text {V}_{\text {DG}}$ </tex-math></inline-formula>) under off-state conditions. Comparison study of devices with and without <inline-formula xmlns:mml="http://www.w3.org/1998/Math/MathML" xmlns:xlink="http://www.w3.org/1999/xlink"> <tex-math notation="LaTeX">$\text {SiN}_{\text {x}}$ </tex-math></inline-formula> passivation reveals the dominant role of surface traps in the extension process. The equivalent surface charging current is derived from the extension time of the depletion region, with which the dominated surface charge transport mechanism is revealed to be Poole-Frenkel emission.

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Publication Details

Journal
IEEE Electron Device Letters
Published
2024-10-24
DOI
https://doi.org/10.1109/led.2024.3485639
Citations
2
Primary Topic
GaN-based semiconductor devices and materials
Type
article
Field-Weighted Citation Impact
0.62

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article

Dynamic Extension Behavior of the Depletion Region in GaN HEMTs Monitored With a Channel-Probe Branch Structure

Jiayin He, Ju Gao, Bin Zhang, Maojun Wang et al.
2 citations
IEEE Electron Device Letters
GaN-based semiconductor devices and materials
0.62
article

Dynamic Extension Behavior of the Depletion Region in GaN HEMTs Monitored With a Channel-Probe Branch Structure

Jiayin He, Ju Gao, Bin Zhang, Maojun Wang, Ziheng Liu, Xin Wang, Chen Wang, Jinyan Wang, Jin Wei, Hongyue Wang
article en
2 citations

Abstract

This letter proposes a method to monitor the dynamic extension process of the depletion region in GaN HEMTs. Based on a channel-probe branch structure, the transient channel potential (<inline-formula xmlns:mml="http://www.w3.org/1998/Math/MathML" xmlns:xlink="http://www.w3.org/1999/xlink"> <tex-math notation="LaTeX">$\text {V}_{\text {CP}}$ </tex-math></inline-formula>) at a certain distance from the gate was measured under off-state conditions. From the transient <inline-formula xmlns:mml="http://www.w3.org/1998/Math/MathML" xmlns:xlink="http://www.w3.org/1999/xlink"> <tex-math notation="LaTeX">$\text {V}_{\text {CP}}$ </tex-math></inline-formula> curves, the extension time of the depletion region was directly obtained for the first time, and it was found to exhibit an exponential dependence on the drain-gate bias (<inline-formula xmlns:mml="http://www.w3.org/1998/Math/MathML" xmlns:xlink="http://www.w3.org/1999/xlink"> <tex-math notation="LaTeX">$\text {V}_{\text {DG}}$ </tex-math></inline-formula>) under off-state conditions. Comparison study of devices with and without <inline-formula xmlns:mml="http://www.w3.org/1998/Math/MathML" xmlns:xlink="http://www.w3.org/1999/xlink"> <tex-math notation="LaTeX">$\text {SiN}_{\text {x}}$ </tex-math></inline-formula> passivation reveals the dominant role of surface traps in the extension process. The equivalent surface charging current is derived from the extension time of the depletion region, with which the dominated surface charge transport mechanism is revealed to be Poole-Frenkel emission.

IEEE Electron Device LettersVol. 45(12)
Peking University (CN)
National Natural Science Foundation of China
Openalex Percentile: Top 32%
GaN-based semiconductor devices and materials
0.62
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