Development of a flat cutoff probe covered with a dielectric layer for non-invasive plasma diagnostics

Abstract Herein, we investigated the effect of a dielectric film on the transmission spectrum of a bar-type flat cutoff probe (BCP). By conducting electromagnetic wave simulations, we found that placing a dielectric film with a thickness of 1 mm or less on the sensor did not affect the measurement of the BCP under thin sheath condition. However, a film thickness of 1 mm or more results in a low-frequency shift in the cutoff frequency. The shift in the cutoff frequency was related not only to the film thickness, but also to the dielectric constant of the film and sheath width, which could be understood through a circuit model of the BCP. The calculated results were experimentally validated using alumina plates of various thicknesses. Consequently, our findings demonstrate that measuring the electron density on a BCP is feasible even when a dielectric film is deposited, thereby improving the accuracy of the measurement.

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Publication Details

Journal
Plasma Sources Science and Technology
Published
2024-10-24
DOI
https://doi.org/10.1088/1361-6595/ad8ae6
Citations
3
Primary Topic
Plasma Diagnostics and Applications
Type
article
Field-Weighted Citation Impact
0.63

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article

Development of a flat cutoff probe covered with a dielectric layer for non-invasive plasma diagnostics

Min Young Yoon, Jung‐Hyung Kim, Gwang-Seok Chae, Hyo‐Chang Lee et al.
3 citations
Plasma Sources Science and Technology
Plasma Diagnostics and Applications
0.63
article

Development of a flat cutoff probe covered with a dielectric layer for non-invasive plasma diagnostics

Min Young Yoon, Jung‐Hyung Kim, Gwang-Seok Chae, Hyo‐Chang Lee, Hee-Jung Yeom
article en
3 citations

Abstract

Abstract Herein, we investigated the effect of a dielectric film on the transmission spectrum of a bar-type flat cutoff probe (BCP). By conducting electromagnetic wave simulations, we found that placing a dielectric film with a thickness of 1 mm or less on the sensor did not affect the measurement of the BCP under thin sheath condition. However, a film thickness of 1 mm or more results in a low-frequency shift in the cutoff frequency. The shift in the cutoff frequency was related not only to the film thickness, but also to the dielectric constant of the film and sheath width, which could be understood through a circuit model of the BCP. The calculated results were experimentally validated using alumina plates of various thicknesses. Consequently, our findings demonstrate that measuring the electron density on a BCP is feasible even when a dielectric film is deposited, thereby improving the accuracy of the measurement.

Plasma Sources Science and TechnologyVol. 33(11)
Korea Aerospace University (KR), Korea Research Institute of Standards and Science (KR)
Ministry of Trade, Industry and Energy, Korea Research Institute of Standards and Science, National Research Foundation of Korea, Ministry of Science and ICT, South Korea, Korea Semiconductor Research Consortium, Korea Evaluation Institute of Industrial Technology
Openalex Percentile: Top 31%
Plasma Diagnostics and Applications
0.63
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